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1 | US10838307B2 |
Apparatus and method for operating an apparatus
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Publication/Patent Number: US10838307B2 | Publication Date: 2020-11-17 | Application Number: 16/520,047 | Filing Date: 2019-07-23 | Inventor： Holz, Markus Bihr, Ulrich | Assignee: Carl Zeiss SMT GmbH | IPC: G03F7/20 | Abstract: An apparatus, for example a lithography apparatus or a multi-mirror system, includes comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the apparatus, a plurality of actuator/sensor devices for the optical components, and a drive device for driving the actuator/sensor devices. | |||
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2 | EP3320401B1 |
LITHOGRAPHY APPARATUS AND METHOD FOR OPERATING A LITHOGRAPHY APPARATUS
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Publication/Patent Number: EP3320401B1 | Publication Date: 2020-02-05 | Application Number: 16736851.3 | Filing Date: 2016-07-07 | Inventor： Dinger, Udo Holz, Markus Bihr, Ulrich | Assignee: Carl Zeiss SMT GmbH | IPC: G03F7/20 | ||||
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3 | EP3423220B1 |
METHOD AND DEVICE FOR THE ADDITIVE MANUFACTURE OF WORKPIECES
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Publication/Patent Number: EP3423220B1 | Publication Date: 2020-02-26 | Application Number: 18724869.5 | Filing Date: 2018-05-15 | Inventor： Niebling, Arno Protzmann, Michael Holz, Markus Franz, Henrik | Assignee: Ald Vacuum Technologies GmbH | IPC: B22F3/105 | ||||
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4 | US10678151B2 |
Control device
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Publication/Patent Number: US10678151B2 | Publication Date: 2020-06-09 | Application Number: 16/284,143 | Filing Date: 2019-02-25 | Inventor： Holz, Markus Horn, Jan Syrowatka, Klaus | Assignee: Carl Zeiss SMT GmbH | IPC: G03B27/54 | Abstract: A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals. | |||
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5 | EP3600729A1 |
METHOD FOR THE ADDITIVE MANUFACTURE OF WORKPIECES
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Publication/Patent Number: EP3600729A1 | Publication Date: 2020-02-05 | Application Number: 18724867.9 | Filing Date: 2018-05-15 | Inventor： Niebling, Arno Protzmann, Michael Holz, Markus Franz, Henrik | Assignee: Ald Vacuum Technologies GmbH | IPC: B22F3/105 | ||||
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6 | US10843259B2 |
Casting method
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Publication/Patent Number: US10843259B2 | Publication Date: 2020-11-24 | Application Number: 16/478,174 | Filing Date: 2018-01-17 | Inventor： Franz, Henrik Spitans, Sergejs Betz, Ulrich Bauer, Egon Holz, Markus | Assignee: ALD VACUUM TECHNOLOGIES GMBH | IPC: B22D39/00 | Abstract: A method for producing cast items in a casting method, wherein a charge of a conductive material is introduced into the sphere of influence of at least one alternating electromagnetic field, so that the charge is kept in a levitating state. The melt is poured into moulds in order to produce turbine blades, prostheses or turbocharger impellers. | |||
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7 | EP3586568B1 |
LEVITATION MELTING
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Publication/Patent Number: EP3586568B1 | Publication Date: 2020-12-16 | Application Number: 19721225.1 | Filing Date: 2019-04-18 | Inventor： Spitans, Sergejs Franz, Henrik Sehring, Björn Holz, Markus | Assignee: ALD Vacuum Technologies GmbH | IPC: H05B6/32 | ||||
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8 | EP3570993B1 |
CASTING METHOD
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Publication/Patent Number: EP3570993B1 | Publication Date: 2020-09-23 | Application Number: 18701010.3 | Filing Date: 2018-01-17 | Inventor： Franz, Henrik Spitans, Sergejs Betz, Ulrich Bauer, Egon Holz, Markus | Assignee: Ald Vacuum Technologies GmbH | IPC: H05B6/32 | ||||
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9 | EP3570993B8 |
CASTING METHOD
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Publication/Patent Number: EP3570993B8 | Publication Date: 2020-11-18 | Application Number: 18701010.3 | Filing Date: 2018-01-17 | Inventor： Franz, Henrik Spitans, Sergejs Betz, Ulrich Bauer, Egon Holz, Markus | Assignee: ALD Vacuum Technologies GmbH | IPC: H05B6/32 | ||||
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10 | EP3586568A1 |
LEVITATION MELTING PROCESS
Title (English):
1
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Publication/Patent Number: EP3586568A1 | Publication Date: 2020-01-01 | Application Number: 19721225.1 | Filing Date: 2019-04-18 | Inventor： Spitans, Sergejs Franz, Henrik Sehring, Björn Holz, Markus | Assignee: Ald Vacuum Technologies GmbH | IPC: H05B6/32 | ||||
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11 | EP3622782B1 |
DEVICE AND METHOD FOR LEVITATION MELTING USING INDUCTION UNITS WHICH ARE ARRANGED IN A TILTED MANNER
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Publication/Patent Number: EP3622782B1 | Publication Date: 2020-09-16 | Application Number: 19739555.1 | Filing Date: 2019-07-09 | Inventor： Spitans, Sergejs Franz, Henrik Sehring, Björn Holz, Markus Krieger, Andreas | Assignee: ALD Vacuum Technologies GmbH | IPC: H05B6/32 | ||||
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12 | EP3622782A1 |
DEVICE AND METHOD FOR LEVITATION MELTING USING INDUCTION UNITS WHICH ARE ARRANGED IN A TILTED MANNER
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Publication/Patent Number: EP3622782A1 | Publication Date: 2020-03-18 | Application Number: 19739555.1 | Filing Date: 2019-07-09 | Inventor： Spitans, Sergejs Franz, Henrik Sehring, Björn Holz, Markus Krieger, Andreas | Assignee: Ald Vacuum Technologies GmbH | IPC: H05B6/32 | ||||
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13 | WO2020016063A1 |
DEVICE AND METHOD FOR LEVITATION MELTING USING INDUCTION UNITS WHICH ARE ARRANGED IN A TILTED MANNER
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Publication/Patent Number: WO2020016063A1 | Publication Date: 2020-01-23 | Application Number: 2019068432 | Filing Date: 2019-07-09 | Inventor： Franz, Henrik Holz, Markus Krieger, Andreas Spitans, Sergejs Sehring, Björn | Assignee: Ald Vacuum Technologies GmbH | IPC: H05B6/44 | Abstract: The invention relates to a levitation melting method and to a device for producing cast bodies using induction units which are arranged in a tilted manner. In the method, induction units are used in which the respective opposing ferrite poles are not designed to lie on one plane with the induction coils but rather are tilted at a specified angle relative to the levitation plane. Thus, the efficiency of the induced magnetic field for melting the batches can be increased with the induction units. By virtue of the tilted assembly, the component of the induced magnetic field which effectively accounts for the holding force of the field for levitating the molten metal is increased. | |||
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14 | DE102018117304A1 |
Vorrichtung und Verfahren zum Schwebeschmelzen mit gekippt angeordneten Induktionseinheiten
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Publication/Patent Number: DE102018117304A1 | Publication Date: 2020-01-23 | Application Number: 102018117304 | Filing Date: 2018-07-17 | Inventor： Franz, Henrik Holz, Markus Krieger, Andreas Spitans, Sergejs Sehring, Björn | Assignee: Ald Vacuum Technologies GmbH | IPC: H05B6/32 | Abstract: Die Erfindung betrifft ein Schwebeschmelzverfahren und eine Vorrichtung zur Herstellung von Gusskörpern mit gekippt angeordneten Induktionseinheiten. Bei dem Verfahren werden Induktionseinheiten eingesetzt, bei denen die jeweils gegenüberliegenden Ferritpole mit den Induktionsspulen nicht in einer Ebene liegend ausgestaltet sind, sondern in einem bestimmten Winkel gekippt zur Levitationsebene. So kann bei den Induktionseinheiten eine Effizienzsteigerung des induzierten Magnetfelds zum Aufschmelzen der Chargen erzielt werden. Durch die gekippte Anordnung wird der Anteil des induzierten Magnetfelds, der effektiv zur Haltekraft des Felds für die Levitation der Schmelze beiträgt, vergrößert. | |||
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15 | US2020110340A1 |
METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION EXPOSURE SYSTEM, AND ILLUMINATION SYSTEM
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Publication/Patent Number: US2020110340A1 | Publication Date: 2020-04-09 | Application Number: 16/704,677 | Filing Date: 2019-12-05 | Inventor： Baier, Juergen Runde, Daniel Manger, Matthias Mueller, Ulrich Lichtenthaeler, Joerg Orthen, André Welker, Joachim Holz, Markus Holderer, Hubert | Assignee: Carl Zeiss SMT GmbH | IPC: G03F7/20 | Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus | |||
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16 | US2019346772A1 |
APPARATUS AND METHOD FOR OPERATING AN APPARATUS
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Publication/Patent Number: US2019346772A1 | Publication Date: 2019-11-14 | Application Number: 16/520,047 | Filing Date: 2019-07-23 | Inventor： Holz, Markus Bihr, Ulrich | Assignee: Carl Zeiss SMT GmbH | IPC: G03F7/20 | Abstract: An apparatus, for example a lithography apparatus or a multi-mirror system, includes comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the apparatus, a plurality of actuator/sensor devices for the optical components, and a drive device for driving the actuator/sensor devices. | |||
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17 | DE102018219782A1 |
Verfahren zur Bestimmung einer Temperatur an einem Punkt einer Komponente einer EUV-Projektionsbelichtungsanlage
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Publication/Patent Number: DE102018219782A1 | Publication Date: 2019-01-10 | Application Number: 102018219782 | Filing Date: 2018-11-19 | Inventor： Holz, Markus Ameling, Ralf | Assignee: CARL ZEISS SMT GMBH | IPC: G02B7/198 | Abstract: Die Erfindung betrifft ein Verfahren zur Bestimmung einer Temperatur an einem Punkt einer Komponente (2) einer Projektionsbelichtungsanlage (1) für die Halbleiterlithographie, wobei die Temperatur anhand einer Positionsänderung mindestens eines Teiles (31) der Komponente (2) ermittelt wird. | |||
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18 | US10261424B2 |
Lithography apparatus and method for operating a lithography apparatus
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Publication/Patent Number: US10261424B2 | Publication Date: 2019-04-16 | Application Number: 15/845,590 | Filing Date: 2017-12-18 | Inventor： Dinger, Udo Holz, Markus Bihr, Ulrich | Assignee: Carl Zeiss SMT GmbH | IPC: G03F7/20 | Abstract: A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency. | |||
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19 | EP3504592A1 |
CONTROL DEVICE
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Publication/Patent Number: EP3504592A1 | Publication Date: 2019-07-03 | Application Number: 17757742.6 | Filing Date: 2017-08-22 | Inventor： Holz, Markus Horn, Jan Syrowatka, Klaus | Assignee: Carl Zeiss SMT GmbH | IPC: G03F7/20 | ||||
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20 | US10514619B2 |
Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system
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Publication/Patent Number: US10514619B2 | Publication Date: 2019-12-24 | Application Number: 15/878,041 | Filing Date: 2018-01-23 | Inventor： Bihr, Ulrich Holz, Markus Horn, Jan | Assignee: Carl Zeiss SMT GmbH | IPC: G03B27/42 | Abstract: The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path. |
3.Current Quota