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Application Number Application Number |
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Inventor Inventor | Assignee Assignee |
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IPC
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21 | US2020286775A1 |
INTERCONNECT STRUCTURE AND METHOD FOR PREPARING THE SAME
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Publication/Patent Number: US2020286775A1 | Publication Date: 2020-09-10 | Application Number: 16/291,376 | Filing Date: 2019-03-04 | Inventor： Wang, Mao-ying Shih, Shing-yih Wu, Hung-mo Ting, Yung-te Lin yu ting | Assignee: NANYA TECHNOLOGY CORPORATION | IPC: H01L21/768 | Abstract: The present disclosure provides an interconnect structure. The interconnect structure includes a first connecting line, a second connecting line disposed over the first connecting line, and a connecting via disposed in a dielectric structure between the first connecting line and the second connecting line, and electrically connecting the first connecting line and the second connecting line. The connecting via includes a head portion and a body portion, and a width of the head portion is greater than a width of the body portion. | |||
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22 | US202043781A1 |
Semiconductor Device and Method
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Publication/Patent Number: US202043781A1 | Publication Date: 2020-02-06 | Application Number: 20/191,659 | Filing Date: 2019-10-11 | Inventor： Tsai, Ming-hsing Wang, Yu-sheng Hung, Chi-cheng Su, Ching-hwanq Lin yu ting Ou, Yang Liang-yueh | Assignee: Taiwan Semiconductor Manufacturing Company, Ltd. | IPC: H01L29/66 | Abstract: A method includes forming a first opening in a dielectric layer over a substrate, lining sidewalls and a bottom of the first opening with a conductive barrier layer, and depositing a seed layer over the conductive barrier layer. The method further includes treating the seed layer with a plasma process, and filling the first opening with a conductive material after the treating the seed layer. | |||
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23 | US10685842B2 |
Selective formation of titanium silicide and titanium nitride by hydrogen gas control
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Publication/Patent Number: US10685842B2 | Publication Date: 2020-06-16 | Application Number: 15/983,216 | Filing Date: 2018-05-18 | Inventor： Chang, Cheng-wei Lin, Kao-feng Hung, Min-hsiu Chao, Yi-hsiang Huang, Huang-yi Lin yu ting | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/285 | Abstract: The present disclosure relates to a method for fabricating a semiconductor structure. The method includes providing a substrate with a gate structure, an insulating structure over the gate structure, and a S/D region; depositing a titanium silicide layer over the S/D region with a first chemical vapor deposition (CVD) process. The first CVD process includes a first hydrogen gas flow. The method also includes depositing a titanium nitride layer over the insulating structure with a second CVD process. The second CVD process includes a second hydrogen gas flow. The first and second CVD processes are performed in a single reaction chamber and a flow rate of the first hydrogen gas flow is higher than a flow rate of the second hydrogen gas flow. | |||
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24 | US10867845B2 |
Semiconductor device and method
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Publication/Patent Number: US10867845B2 | Publication Date: 2020-12-15 | Application Number: 16/599,940 | Filing Date: 2019-10-11 | Inventor： Wang, Yu-sheng Hung, Chi-cheng Su, Ching-hwanq Ou, Yang Liang-yueh Tsai, Ming-hsing Lin yu ting | Assignee: Taiwan Semiconductor Manufacturing Company, Ltd. | IPC: H01L21/768 | Abstract: A method includes forming a first opening in a dielectric layer over a substrate, lining sidewalls and a bottom of the first opening with a conductive barrier layer, and depositing a seed layer over the conductive barrier layer. The method further includes treating the seed layer with a plasma process, and filling the first opening with a conductive material after the treating the seed layer. | |||
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25 | US2020294807A1 |
SELECTIVE FORMATION OF TITANIUM SILICIDE AND TITANIUM NITRIDE BY HYDROGEN GAS CONTROL
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Publication/Patent Number: US2020294807A1 | Publication Date: 2020-09-17 | Application Number: 16/887,218 | Filing Date: 2020-05-29 | Inventor： Chang, Cheng-wei Lin, Kao-feng Hung, Min-hsiu Chao, Yi-hsiang Huang, Huang-yi Lin yu ting | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/285 | Abstract: The present disclosure relates to a method for fabricating a semiconductor structure. The method includes providing a substrate with a gate structure, an insulating structure over the gate structure, and a S/D region; depositing a titanium silicide layer over the S/D region with a first chemical vapor deposition (CVD) process. The first CVD process includes a first hydrogen gas flow. The method also includes depositing a titanium nitride layer over the insulating structure with a second CVD process. The second CVD process includes a second hydrogen gas flow. The first and second CVD processes are performed in a single reaction chamber and a flow rate of the first hydrogen gas flow is higher than a flow rate of the second hydrogen gas flow. | |||
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26 | US2020043781A1 |
Semiconductor Device and Method
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Publication/Patent Number: US2020043781A1 | Publication Date: 2020-02-06 | Application Number: 16/599,940 | Filing Date: 2019-10-11 | Inventor： Wang, Yu-sheng Hung, Chi-cheng Su, Ching-hwanq Ou, Yang Liang-yueh Tsai, Ming-hsing Lin yu ting | Assignee: Taiwan Semiconductor Manufacturing Company, Ltd. | IPC: H01L21/768 | Abstract: A method includes forming a first opening in a dielectric layer over a substrate, lining sidewalls and a bottom of the first opening with a conductive barrier layer, and depositing a seed layer over the conductive barrier layer. The method further includes treating the seed layer with a plasma process, and filling the first opening with a conductive material after the treating the seed layer. | |||
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27 | US2020105519A1 |
PRE-CLEAN FOR CONTACTS
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Publication/Patent Number: US2020105519A1 | Publication Date: 2020-04-02 | Application Number: 16/146,529 | Filing Date: 2018-09-28 | Inventor： Lin yu ting Kao, Chen-yuan Lin, Rueijer Wang, Yu-sheng Chen, I-li Wu, Hong-ming | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/02 | Abstract: The present disclosure describes a method that includes forming a dielectric layer over a contact region on a substrate; etching the dielectric layer to form a contact opening to expose the contact region; and pre-cleaning the exposed contact region to remove a residual material formed by the etching. During the pre-cleaning, the first contact region is exposed to an inductively coupled radio frequency (RF) plasma. Also, during the pre-cleaning, a direct current power supply unit (DC PSU) provides a bias voltage to the substrate and a magnetic field is applied to the inductively coupled RF plasma to collimate ions. | |||
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28 | US2020343087A1 |
Pre-Clean for Contacts
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Publication/Patent Number: US2020343087A1 | Publication Date: 2020-10-29 | Application Number: 16/927,638 | Filing Date: 2020-07-13 | Inventor： Lin yu ting Kao, Chen-yuan Lin, Rueijer Wang, Yu-sheng Chen, I-li Wu, Hong-ming | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/02 | Abstract: The present disclosure describes a method that includes forming a dielectric layer over a contact region on a substrate; etching the dielectric layer to form a contact opening to expose the contact region; and pre-cleaning the exposed contact region to remove a residual material formed by the etching. During the pre-cleaning, the contact region is exposed to an inductively coupled radio frequency (RF) plasma. Also, during the pre-cleaning, a direct current power supply unit (DC PSU) provides a bias voltage to the substrate and a magnetic field is applied to the inductively coupled RF plasma to collimate ions. | |||
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29 | US10714329B2 |
Pre-clean for contacts
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Publication/Patent Number: US10714329B2 | Publication Date: 2020-07-14 | Application Number: 16/146,529 | Filing Date: 2018-09-28 | Inventor： Lin yu ting Kao, Chen-yuan Lin, Rueijer Wang, Yu-sheng Chen, I-li Wu, Hong-ming | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/4763 | Abstract: The present disclosure describes a method that includes forming a dielectric layer over a contact region on a substrate; etching the dielectric layer to form a contact opening to expose the contact region; and pre-cleaning the exposed contact region to remove a residual material formed by the etching. During the pre-cleaning, the first contact region is exposed to an inductively coupled radio frequency (RF) plasma. Also, during the pre-cleaning, a direct current power supply unit (DC PSU) provides a bias voltage to the substrate and a magnetic field is applied to the inductively coupled RF plasma to collimate ions. | |||
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30 | US10846262B2 |
Data migration to a cloud computing system
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Publication/Patent Number: US10846262B2 | Publication Date: 2020-11-24 | Application Number: 16/241,262 | Filing Date: 2019-01-07 | Inventor： Yap, Joe Keng Thangaraju, Mahadevan Livingston, Sean L. Cannerozzi, Roberta Moussa, Ghania Estrin, Ron Shimon Lin yu ting Bourdages, Simon Nguyen, Trung Duc Cai, Wenyu Koehne, Zachary Adam Simek, Patrick J. Gulati, Sukhvinder Singh Canning, Ben | Assignee: Microsoft Technology Licensing, LLC | IPC: G06F16/11 | Abstract: A cloud-based migration system exposes a source-independent application programming interface for receiving data to be migrated. The data is uploaded and stored as a single entity in a cloud-based storage system. A migration system then accesses the migration package and begins migrating the data to its destination, from the cloud-based storage system. | |||
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31 | US2020387476A1 |
DATA MIGRATION TO A CLOUD COMPUTING SYSTEM
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Publication/Patent Number: US2020387476A1 | Publication Date: 2020-12-10 | Application Number: 17/002,021 | Filing Date: 2020-08-25 | Inventor： Yap, Joe Keng Thangaraju, Mahadevan Livingston, Sean L. Cannerozzi, Roberta Moussa, Ghania Estrin, Ron Shimon Lin yu ting Bourdages, Simon Nguyen, Trung Duc Cai, Wenyu Koehne, Zachary Adam Simek, Patrick J. Gulati, Sukhvinder Singh Canning, Ben | Assignee: Microsoft Technology Licensing, LLC | IPC: G06F16/11 | Abstract: A cloud-based migration system exposes a source-independent application programming interface for receiving data to be migrated. The data is uploaded and stored as a single entity in a cloud-based storage system. A migration system then accesses the migration package and begins migrating the data to its destination, from the cloud-based storage system. | |||
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32 | TW201904603A |
Use of black tomato extracts for reducing eye pressure and retina impairment caused by blue light and improving accommodative facility in eyes
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Publication/Patent Number: TW201904603A | Publication Date: 2019-02-01 | Application Number: 106119872 | Filing Date: 2017-06-14 | Inventor： Lin, Yu Ting Lin, Yung Hsiang | Assignee: TCI CO., LTD | IPC: A61P27/02 | Abstract: The present invention provides uses of a black tomato extract for manufacture of composition for reducing eye pressure and retina impairment caused by blue light and improving accommodative facility in eyes. The black tomato extract is prepared by extracting black tomato using water, alcohols, or mixtures of water and alcohols as solvents. The present invention also provides uses of the black tomato extract as a scavenger of reactive oxygen species (ROS). The black tomato extract is effective in reducing ROS accumulation in retina cells exposed to blue light and may reduce oxidative impairment in retina. The black tomato extract also reduces eye pressure and improves accommodative facility in eyes, and thus it has the potential to decrease the risk of glaucoma and the incidence and deterioration of near vision. | |||
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33 | KR20190050927A |
MMP2 Use of Mimosa pudica extracts for manufacture of composition for inhibiting MMP2 gene expression and collagen degradation
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Publication/Patent Number: KR20190050927A | Publication Date: 2019-05-14 | Application Number: 20180008689 | Filing Date: 2018-01-24 | Inventor： Lin, Yung Hsiang Lin, Yu Ting | Assignee: TCI CO., LTD. | IPC: A61Q19/08 | Abstract: The present invention provides a use of a Mimosa pudica extract for manufacturing a composition inhibiting expression of matrix metalloproteinase 2 (MMP2) gene and for manufacturing a composition inhibiting collagen degradation. The Mimosa pudica extract according to the present invention is manufactured by extracting Mimosa pudica using water, alcohols, or an alcohol-water mixture as a solvent. The Mimosa pudica extract inhibits gene expression of MMP2 in dermal fibroblasts to reduce collagen degradation in the skin, thereby improving skin elasticity and compactness, reducing the appearance of fine lines and wrinkles of skin, and delaying skin aging. | |||
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34 | TWI667035B |
Use of black tomato extracts for reducing eye pressure and retina impairment caused by blue light and improving accommodative facility in eyes
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Publication/Patent Number: TWI667035B | Publication Date: 2019-08-01 | Application Number: 106119872 | Filing Date: 2017-06-14 | Inventor： Lin, Yu Ting Lin, Yung Hsiang | Assignee: TCI CO., LTD | IPC: A61P27/02 | Abstract: The present invention provides uses of a black tomato extract for manufacture of composition for reducing eye pressure and retina impairment caused by blue light and improving accommodative facility in eyes. The black tomato extract is prepared by extracting black tomato using water, alcohols, or mixtures of water and alcohols as solvents. The present invention also provides uses of the black tomato extract as a scavenger of reactive oxygen species (ROS). The black tomato extract is effective in reducing ROS accumulation in retina cells exposed to blue light and may reduce oxidative impairment in retina. The black tomato extract also reduces eye pressure and improves accommodative facility in eyes, and thus it has the potential to decrease the risk of glaucoma and the incidence and deterioration of near vision. | |||
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35 | TWI657820B |
Herba ecliptae extract having functionality to inhibit the gene expression of melanocortin 1-receptor and microphthalamia-associated transcription factor
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Publication/Patent Number: TWI657820B | Publication Date: 2019-05-01 | Application Number: 106112060 | Filing Date: 2017-04-11 | Inventor： Lin, Yu Ting Lin, Yung Hsiang Chen, I Hui | Assignee: TCI CO., LTD | IPC: A61Q19/02 | Abstract: The present invention provides a Herba Ecliptae extract, which can inhibit the activity of tyrosinase in the melanoma cells, the secretion of prostaglandin E2 in the keratinocyte, and finally can achieve the effect of reducing melanin formation by inhibition gene expression of melanocortin 1-receptor and microphthalamia-associated transcription factor. | |||
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36 | US10510851B2 |
Low resistance contact method and structure
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Publication/Patent Number: US10510851B2 | Publication Date: 2019-12-17 | Application Number: 15/583,570 | Filing Date: 2017-05-01 | Inventor： Wang, Yu-sheng Lin yu ting | Assignee: Taiwan Semiconductor Manufacturing Company, Ltd. | IPC: H01L29/417 | Abstract: A device includes a metal-silicide region formed in a semiconductor material in a contact opening. A concentration of a material, including chlorine, fluorine, or a combination thereof is in the metal-silicide region near an uppermost surface of the metal-silicide region. The presence of chlorine or fluorine results from a physical bombarding of the chlorine or fluorine in the contact opening. As a result of the physical bombard, the opening becomes wider at the bottom of the opening and the sidewalls of the opening are thinned. A capping layer is over the metal-silicide region and over sidewalls of a contact plug opening. A contact plug is formed over the capping layer, filling the contact plug opening. Before the contact plug is formed, a silicidation occurs to form the metal-silicide and the metal-silicide is wider than the bottom of the opening. | |||
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37 | US2019134134A1 |
METHOD FOR REDUCING THE CONTENT OF HEAVY METALS IN BLOOD AND IMPROVING THE PULMONARY FUNCTION USING GREEN PEAR FRUITLET EXTRACT
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Publication/Patent Number: US2019134134A1 | Publication Date: 2019-05-09 | Application Number: 16/174,573 | Filing Date: 2018-10-30 | Inventor： Lin, Yung-hsiang Lin yu ting | Assignee: TCI CO., LTD. | IPC: A61K36/73 | Abstract: The present invention provides a method for reducing the content of heavy metals in blood and improving the pulmonary function using green pear fruitlet extract. The green pear fruitlet extract can effectively reduce the content of harmful heavy metals in human body to prevent the harmful effects of heavy metals, and improve forced vital capacity and the peak expiratory flow of humans to reduce the respiratory resistance and increase the expiratory flow. The green pear fruitlet extract is prepared by extracting green pear fruitlet using water, alcohol, or a mixture of water and alcohol as a solvent. | |||
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38 | US2019358284A1 |
METHOD FOR PROMOTING HAIR GROWTH USING BANANA STAMEN EXTRACT
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Publication/Patent Number: US2019358284A1 | Publication Date: 2019-11-28 | Application Number: 16/174,948 | Filing Date: 2018-10-30 | Inventor： Lin, Yung-hsiang Lin yu ting | Assignee: TCI CO., LTD. | IPC: A61K36/88 | Abstract: The present invention relates to a use of a banana stamen extract for promoting hair growth. The banana stamen extract according to the present invention promotes gene expression of VEGF and IGF1 to enhance the proliferation level of hair follicles, so that the density of hairs grown is increased. In addition, the banana stamen extract also inhibits gene expression of SRD5A1, SRDA2 and AR to decrease hair loss, and promote the gene expression of KROX20 so as to significantly enhance hair growth. | |||
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39 | TW201907942A |
Use of Mimosa pudica extracts for manufacture of composition for inhibiting MMP2 gene expression and collagen degradation
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Publication/Patent Number: TW201907942A | Publication Date: 2019-03-01 | Application Number: 106124594 | Filing Date: 2017-07-21 | Inventor： Lin yu ting Lin, Yung-hsiang | Assignee: TCI CO., LTD. | IPC: A61P43/00 | Abstract: The present invention provides uses of a Mimosa pudica extract for manufacture of composition for inhibiting MMP2 gene expression and collagen degradation. The Mimosa pudica extract is prepared by extraction of Mimosa pudica using water, alcohols, or mixtures of water and alcohols as solvents. The Mimosa pudica extract can reduce collagen degradation via inhibiting MMP2 gene expression in skin fibroblasts, and thus contributes to improving skin elasticity and firmness, reducing fine lines wrinkles, and retarding skin aging. | |||
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40 | US201983384A1 |
METHOD FOR CONDITIONING SKIN BY USING EARTHWORM PROTEIN
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Publication/Patent Number: US201983384A1 | Publication Date: 2019-03-21 | Application Number: 20/171,585 | Filing Date: 2017-12-22 | Inventor： Lin yu ting Lin, Yung-hsiang | Assignee: TCI Co., Ltd. | IPC: A61Q19/00 | Abstract: A method for conditioning skin is provided, which comprises applying to a subject in need an effective amount of a composition, wherein the composition comprises earthworm protein. The method is especially for reducing the concentration of erythema on skin and/or decreasing the size of pores on skin. |
3.Current Quota