| No. | Publication Number | Title | Publication/Patent Number Publication/Patent Number |
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Application Number Application Number |
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Filing Date
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Inventor Inventor | Assignee Assignee |
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IPC
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41 | US2019083384A1 |
METHOD FOR CONDITIONING SKIN BY USING EARTHWORM PROTEIN
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Publication/Patent Number: US2019083384A1 | Publication Date: 2019-03-21 | Application Number: 15/853,070 | Filing Date: 2017-12-22 | Inventor： Lin, Yung-hsiang Lin yu ting | Assignee: TCI CO., LTD. | IPC: A61K8/98 | Abstract: A method for conditioning skin is provided, which comprises applying to a subject in need an effective amount of a composition, wherein the composition comprises earthworm protein. The method is especially for reducing the concentration of erythema on skin and/or decreasing the size of pores on skin. | |||
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42 | TW201916873A |
Uses of pyrenaria buisanensis extract
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Publication/Patent Number: TW201916873A | Publication Date: 2019-05-01 | Application Number: 107132950 | Filing Date: 2018-09-19 | Inventor： Lin yu ting Lin, Yung-hsiang | Assignee: TCI CO., LTD. | IPC: A61Q19/00 | Abstract: Uses of Pyrenaria buisanensis extract are provided, comprising the use of Pyrenaria buisanensis extract in moisturizing skin, whitening skin, tightening skin, reducing skin fine lines, anti-skin aging, alleviating dry skin, promoting formation of hyaluronic acid in the skin, assisting in maintaining health of skin, or manufacturing a pharmaceutical composition. The pharmaceutical composition is useful in anti-photodamage, repairing skin tissues, preventing skin diseases, and/or treating skin diseases, or in at least one of preventing cardiovascular diseases, treating cardiovascular diseases, preventing diabetes, treating diabetes, preventing neurodegenerative diseases, and treating neurodegenerative diseases. | |||
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43 | US2019117553A1 |
USES OF PYRENARIA BUISANENSIS EXTRACT
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Publication/Patent Number: US2019117553A1 | Publication Date: 2019-04-25 | Application Number: 16/161,432 | Filing Date: 2018-10-16 | Inventor： Lin, Yung-hsiang Lin yu ting | Assignee: TCI Co., Ltd. | IPC: A61K8/9789 | Abstract: A method for at least one of whitening skin, improving skin condition, protecting skin, and treating skin disease is provided, wherein the method comprises administering to a subject in need an effective amount of a Pyrenaria buisanensis extract. A method for at least one of preventing cardiovascular disease, treating cardiovascular disease, preventing diabetes, treating diabetes, preventing neurodegenerative disease, and treating neurodegenerative disease is also provided, wherein the method comprises administering to a subject in need an effective amount of a Pyrenaria buisanensis extract. | |||
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44 | TW201918256A |
Use of green pear fruitlet extract for reducing heavy metals in the blood and improving the lung function
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Publication/Patent Number: TW201918256A | Publication Date: 2019-05-16 | Application Number: 107137398 | Filing Date: 2018-10-23 | Inventor： Lin yu ting Lin, Yung-hsiang | Assignee: TCI CO., LTD | IPC: A61P43/00 | Abstract: The present invention provides a use of green pear fruitlet extract for reducing heavy metal in the blood and improving the lung function. The green pear fruitlet extract can effectively reduce the content of harmful heavy metals commonly found in air pollution, and can effectively improve the forced vital capacity (FVC) and the peak expiratory flow (PPEF), to reduce the airway resistance and to increase the expiratory flow. The green pear extract have the effect of preventing the harmful effects of harmful heavy metals, smoothing the breath and improving lung capacity on human bodies. The green pear fruitlet extract is prepared by extracting green pear fruitlet using water, alcohols, or mixtures of water and alcohols as solvents. | |||
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45 | US2019142891A1 |
FERMENTATION PRODUCT OF MUNG BEAN HULL AND USES OF THE SAME
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Publication/Patent Number: US2019142891A1 | Publication Date: 2019-05-16 | Application Number: 16/182,198 | Filing Date: 2018-11-06 | Inventor： Lin, Yung-hsiang Lin yu ting | Assignee: TCI CO., LTD. | IPC: A61K36/48 | Abstract: A fermentation product of mung bean hull and its uses are provided, wherein the fermentation product is provided by fermenting a mung bean hull and/or an extract of mung bean hull in the present of Lactobacillus plantarum. And, the fermentation product of mung bean hull is used for regulating blood sugar, assisting in regulation of blood pressure, assisting in regulation of blood lipid, preventing hypertension, reducing blood pressure, preventing hypertriglyceridemia, reducing blood lipid, preventing hyperglycemia, reducing blood sugar, preventing cardiovascular disease, treating cardiovascular disease, preventing diabetes, and/or treating diabetes. | |||
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46 | TW201914575A |
Use of earthworm extracts for preparing a pharmaceutical composition for skin conditioning
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Publication/Patent Number: TW201914575A | Publication Date: 2019-04-16 | Application Number: 106132142 | Filing Date: 2017-09-19 | Inventor： Lin yu ting Lin, Yung-hsiang | Assignee: TCI CO., LTD | IPC: A61Q19/00 | Abstract: The present invention relates to a use of earthworm extracts. Particularly, the present invention provides a use of earthworm extracts for preparing a pharmaceutical composition which can decrease erythema content and pore size of the skin. As such, the pharmaceutical composition comprising the earthworm extracts has effects of calming, anti-sensitive, easing and anti-inflammation. | |||
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47 | TW201918255A |
Fermentation product of mung bean hull and uses of the same
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Publication/Patent Number: TW201918255A | Publication Date: 2019-05-16 | Application Number: 107135019 | Filing Date: 2018-10-04 | Inventor： Lin yu ting Lin, Yung-hsiang | Assignee: TCI CO., LTD. | IPC: C12R1/25 | Abstract: A fermentation product of mung bean hull and its uses are provided, wherein the fermentation product is provided by subjecting the mung bean hull to a fermentation in the present of Lactobacillus plantarum. And, the fermentation product of mung bean hull is use for regulating blood sugar, assisting in regulation of blood pressure, assisting in regulation of blood lipid, or manufacturing a pharmaceutical composition. The pharmaceutical composition is for preventing hypertension, reducing blood pressure, preventing hypertriglyceridemia, reducing blood lipid, preventing hyperglycemia, reducing blood sugar, preventing cardiovascular disease, treating cardiovascular disease, preventing diabetes, and/or treating diabetes. | |||
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48 | TW201900194A |
Use of ascophyllum nodosum extracts for regulating expression of gene groups
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Publication/Patent Number: TW201900194A | Publication Date: 2019-01-01 | Application Number: 107115303 | Filing Date: 2018-05-04 | Inventor： Lin yu ting Lin, Yung-hsiang | Assignee: TCI CO., LTD. | IPC: A61P43/00 | Abstract: The present invention provides uses of an Ascophyllum nodosum extract for manufacture of composition for regulating expression of a gene group, wherein the gene group includes a Group A gene selected from the group consisting of TGM1, KRT14, FLG, AQP3, GBA, HAS3, and combinations thereof, and a Group B gene selected from the group consisting of HAS2, MMP2, LOX, and combinations thereof. The Ascophyllum nodosum extract improves skin moisture, skin elasticity, and resistance to ultraviolet radiation. | |||
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49 | TWI659997B |
Chemically amplified positive photoresist composition
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Publication/Patent Number: TWI659997B | Publication Date: 2019-05-21 | Application Number: 107104681 | Filing Date: 2018-02-09 | Inventor： Lin yu ting Huang, Hsin-yi Lee, Hsing-chieh | Assignee: EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION | IPC: G03F7/039 | Abstract: A chemically amplified positive photoresist composition is disclosed, which comprises: (A) 15 to 30 parts by weight of an acrylate resin comprising monomers represented by the following formulas (1) to (3); and (B) 0.05 to 1 parts by weight of a photo-acid generator. Herein, R1 to R6 are defined in the specification. | |||
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50 | TW201929888A |
Use of Elsholtzia ciliata Hylander extracts for treating lung tissue damage and inhibiting pulmonary fibrosis
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Publication/Patent Number: TW201929888A | Publication Date: 2019-08-01 | Application Number: 107143967 | Filing Date: 2018-12-06 | Inventor： Lin yu ting Lin, Yung-hsiang Li, Zih-yi | Assignee: TCI CO., LTD. | IPC: A61P11/00 | Abstract: The present invention provides use of an Elsholtzia ciliata Hylander extract for manufacture of a pharmaceutical composition for treating lung tissue damage and inhibiting pulmonary fibrosis. The Elsholtzia ciliata Hylander extract is preferably prepared by extraction of Elsholtzia ciliata Hylander using water as solvents. Said extract improves the wound healing ability of lung epithelial cells, inhibits secretion of proinflammatory cytokines and enhances E-cadherin expression in lung epithelial cells, and reduces glycated protein formation. | |||
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51 | TW201934646A |
Chemically amplified positive photoresist composition
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Publication/Patent Number: TW201934646A | Publication Date: 2019-09-01 | Application Number: 107104681 | Filing Date: 2018-02-09 | Inventor： Lin yu ting Huang, Hsin-yi Lee, Hsing-chieh | Assignee: EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION | IPC: G03F7/039 | Abstract: A chemically amplified positive photoresist composition is disclosed, which comprises: (A) 15 to 30 parts by weight of an acrylate resin comprising monomers represented by the following formulas (1) to (3); and (B) 0.05 to 1 parts by weight of a photo-acid generator. Herein, R1 to R6 are defined in the specification. | |||
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52 | TWI671432B |
Conductive feature formation and structure
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Publication/Patent Number: TWI671432B | Publication Date: 2019-09-11 | Application Number: 107116123 | Filing Date: 2018-05-11 | Inventor： Wang, Chun Chieh Lin, Yu Ting Huang, Huang Yi Chang, Cheng Wei Hung, Min Hsiu | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/205 | Abstract: Generally, the present disclosure provides example embodiments relating to conductive features, such as metal contacts, vias, lines, etc., and methods for forming those conductive features. In a method embodiment, a dielectric layer is formed on a semiconductor substrate. The semiconductor substrate has a source/drain region. An opening is formed through the dielectric layer to the source/drain region. A silicide region is formed on the source/drain region and a barrier layer is formed in the opening along sidewalls of the dielectric layer by a same Plasma-Enhance Chemical Vapor Deposition (PECVD) process. | |||
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53 | TWI647791B |
Methods of forming semiconductor structures
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Publication/Patent Number: TWI647791B | Publication Date: 2019-01-11 | Application Number: 106135913 | Filing Date: 2017-10-19 | Inventor： Wang, Yu Sheng Lin, Yu Ting Liu, Hsiao Ping Hsu, Hung Chang Lin, Yuan Wen Lu, Hung Pin | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/768 | Abstract: A method includes forming an Inter-layer Dielectric (ILD) having a portion at a same level as a metal gate of a transistor. The ILD and the metal gate are parts of a wafer. The ILD is etched to form a contact opening. The wafer is placed into a PVD tool, with a metal target in the PVD tool. The metal target has a first spacing from a magnet over the metal target, and a second spacing from the wafer. A ratio of the first spacing to the second spacing is greater than about 0.02. A metal layer is deposited on the wafer, with the metal layer having a bottom portion in the contact opening, and a sidewall portion in the contact opening. An anneal is performed to react the bottom portion of the metal layer with the source/drain region to form a silicide region. | |||
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54 | TW201925525A |
Conductive feature formation and structure
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Publication/Patent Number: TW201925525A | Publication Date: 2019-07-01 | Application Number: 107116123 | Filing Date: 2018-05-11 | Inventor： Wang, Chun Chieh Lin, Yu Ting Huang, Huang Yi Chang, Cheng Wei Hung, Min Hsiu | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/205 | Abstract: Generally, the present disclosure provides example embodiments relating to conductive features, such as metal contacts, vias, lines, etc., and methods for forming those conductive features. In a method embodiment, a dielectric layer is formed on a semiconductor substrate. The semiconductor substrate has a source/drain region. An opening is formed through the dielectric layer to the source/drain region. A silicide region is formed on the source/drain region and a barrier layer is formed in the opening along sidewalls of the dielectric layer by a same Plasma-Enhance Chemical Vapor Deposition (PECVD) process. | |||
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55 | KR20190062112A |
CONDUCTIVE FEATURE FORMATION AND STRUCTURE
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Publication/Patent Number: KR20190062112A | Publication Date: 2019-06-05 | Application Number: 20180034001 | Filing Date: 2018-03-23 | Inventor： Lin, Yu Ting Hung, Min Hsiu Chang, Cheng Wei Huang, Huang Yi Wang, Chun Chieh | Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. | IPC: H01L21/768 | Abstract: Generally, the present invention provides example embodiments relating to conductive features, such as metal contacts, vias, lines, and the like, and methods for forming the conductive features. In an embodiment of the method of the present invention, a dielectric layer is formed on a semiconductor substrate. The semiconductor substrate has a source/drain region. An opening part is formed through the dielectric layer to the source/drain region. A silicide region is formed on the source/drain region and a barrier layer is formed in the opening part along sidewalls of the dielectric layer by a same plasma-enhance chemical vapor deposition (PECVD) process. | |||
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56 | US2019178809A1 |
WORKPIECE SURFACE DETECTION METHOD AND SYSTEM USING THE SAME
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Publication/Patent Number: US2019178809A1 | Publication Date: 2019-06-13 | Application Number: 16/275,891 | Filing Date: 2019-02-14 | Inventor： Chiu, Wei-yao Hung, Kuo-feng Lin yu ting Chang, Keng-hao | Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE | IPC: G01N21/88 | Abstract: A detecting method for a workpiece surface includes the following steps. Firstly, a workpiece is provided with a first environment, wherein the first environment has a first environmental temperature higher than a first saturation temperature corresponding to an environmental-relative humidity. Then, the workpiece is provided with a second environment, wherein the second environment has a second environmental temperature lower than the first environmental temperature, such that a itself-temperature of the workpiece reduces to a mist temperature, wherein the mist temperature is substantially equal to or higher than the second environmental temperature. Then, the workpiece is provided with a mist environment, wherein the mist environment has a mist-saturation temperature corresponding to a mist-environmental relative humidity is equal to or higher than the mist temperature for misting a surface of the workpiece. Then, the surface of the misted workpiece is detected. | |||
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57 | US10261025B2 |
Workpiece surface detection method and system using the same
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Publication/Patent Number: US10261025B2 | Publication Date: 2019-04-16 | Application Number: 15/392,325 | Filing Date: 2016-12-28 | Inventor： Chiu, Wei-yao Hung, Kuo-feng Lin yu ting Chang, Keng-hao | Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE | IPC: G01N21/88 | Abstract: A detecting method for a workpiece surface includes the following steps. Firstly, a workpiece is provided with a first environment, wherein the first environment has a first environmental temperature higher than a first saturation temperature corresponding to an environmental-relative humidity. Then, the workpiece is provided with a second environment, wherein the second environment has a second environmental temperature lower than the first environmental temperature, such that a itself-temperature of the workpiece reduces to a mist temperature, wherein the mist temperature is substantially equal to or higher than the second environmental temperature. Then, the workpiece is provided with a mist environment, wherein the mist environment has a mist-saturation temperature corresponding to a mist-environmental relative humidity is equal to or higher than the mist temperature for misting a surface of the workpiece. Then, the surface of the misted workpiece is detected. | |||
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58 | US10391476B2 |
Inorganic nanofiber and method for manufacturing the same
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Publication/Patent Number: US10391476B2 | Publication Date: 2019-08-27 | Application Number: 15/406,962 | Filing Date: 2017-01-16 | Inventor： Yeh, Ping-hung Lai, Chun-yen Lin yu ting Pan, Pin-chun | Assignee: TAMKANG UNIVERSITY | IPC: B01J21/14 | Abstract: An organic nanofiber includes a fiber body containing multiple inorganic oxide particles selected from polycrystalline titanium dioxide particles and polycrystalline tin(IV) oxide particles, and having a particle size ranging from 15 to 75 nm. A method for manufacturing the inorganic nanofibers, including: mixing a metal precursor, an organic polymer and a solvent to obtain a solution, the metal precursor being a titanium-containing precursor or a tin-containing precursor; electrospinning the solution at a relative humidity ranging from 50 to 60% to form multiple nanofibers; and annealing the nanofibers at a temperature ranging from 600 to 800° C. to obtain multiple inorganic nanofibers. | |||
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59 | US10269926B2 |
Purging deposition tools to reduce oxygen and moisture in wafers
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Publication/Patent Number: US10269926B2 | Publication Date: 2019-04-23 | Application Number: 15/246,071 | Filing Date: 2016-08-24 | Inventor： Liu, Yi-ying Nieh, Chun-wen Wang, Yu-sheng Lin yu ting Chen, Wei-yu | Assignee: Taiwan Semiconductor Manufacturing Company, Ltd. | IPC: H01L21/02 | Abstract: A method includes placing a wafer in a wafer holder, placing the wafer holder on a loadport of a deposition tool, connecting the wafer holder to a front-end interface unit of the deposition tool, purging the front-end interface unit with nitrogen, and depositing a metal layer on the wafer in the deposition tool. | |||
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60 | DE102018100300A1 |
BILDEN EINES LEITFÄHIGEN MERKMALS UND EINER STRUKTUR
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Publication/Patent Number: DE102018100300A1 | Publication Date: 2019-05-29 | Application Number: 102018100300 | Filing Date: 2018-01-09 | Inventor： Lin yu ting Wang, Chun-chieh Huang, Huang-yi Chang, Cheng-wei Hung, Min-hsiu | Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. | IPC: H01L21/3065 | Abstract: Im Allgemeinen stellt die vorliegende Offenbarung beispielhafte Ausführungsformen in Zusammenhang mit leitfähigen Merkmalen, wie Metallkontakten, Durchkontaktierungen, Leitungen usw. sowie Verfahren zum Bilden dieser leitfähigen Merkmale bereit. Bei einer Verfahrensausführungsform wird eine dielektrische Schicht auf einem Halbleitersubstrat gebildet. Das Halbleitersubstrat hat einen Source/Drain-Bereich. Eine Öffnung wird durch die dielektrische Schicht zu dem Source/Drain-Bereich gebildet. Ein Silizidbereich wird auf dem Source/Drain-Bereich gebildet, und eine Sperrschicht wird in der Öffnung entlang von Seitenwänden der dielektrischen Schicht durch ein und denselben plasmaverstärkten chemischen Dampfabscheidungs- (PECVD)-Prozess gebildet. |
3.Current Quota