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No. Publication Number Title Publication/Patent Number Publication/Patent Number Publication Date Publication Date
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Inventor Inventor Assignee Assignee IPC IPC
41
US2019083384A1
METHOD FOR CONDITIONING SKIN BY USING EARTHWORM PROTEIN
Publication/Patent Number: US2019083384A1 Publication Date: 2019-03-21 Application Number: 15/853,070 Filing Date: 2017-12-22 Inventor: Lin, Yung-hsiang   Lin yu ting   Assignee: TCI CO., LTD.   IPC: A61K8/98 Abstract: A method for conditioning skin is provided, which comprises applying to a subject in need an effective amount of a composition, wherein the composition comprises earthworm protein. The method is especially for reducing the concentration of erythema on skin and/or decreasing the size of pores on skin.
42
TW201916873A
Uses of pyrenaria buisanensis extract
Publication/Patent Number: TW201916873A Publication Date: 2019-05-01 Application Number: 107132950 Filing Date: 2018-09-19 Inventor: Lin yu ting   Lin, Yung-hsiang   Assignee: TCI CO., LTD.   IPC: A61Q19/00 Abstract: Uses of Pyrenaria buisanensis extract are provided, comprising the use of Pyrenaria buisanensis extract in moisturizing skin, whitening skin, tightening skin, reducing skin fine lines, anti-skin aging, alleviating dry skin, promoting formation of hyaluronic acid in the skin, assisting in maintaining health of skin, or manufacturing a pharmaceutical composition. The pharmaceutical composition is useful in anti-photodamage, repairing skin tissues, preventing skin diseases, and/or treating skin diseases, or in at least one of preventing cardiovascular diseases, treating cardiovascular diseases, preventing diabetes, treating diabetes, preventing neurodegenerative diseases, and treating neurodegenerative diseases.
43
US2019117553A1
USES OF PYRENARIA BUISANENSIS EXTRACT
Publication/Patent Number: US2019117553A1 Publication Date: 2019-04-25 Application Number: 16/161,432 Filing Date: 2018-10-16 Inventor: Lin, Yung-hsiang   Lin yu ting   Assignee: TCI Co., Ltd.   IPC: A61K8/9789 Abstract: A method for at least one of whitening skin, improving skin condition, protecting skin, and treating skin disease is provided, wherein the method comprises administering to a subject in need an effective amount of a Pyrenaria buisanensis extract. A method for at least one of preventing cardiovascular disease, treating cardiovascular disease, preventing diabetes, treating diabetes, preventing neurodegenerative disease, and treating neurodegenerative disease is also provided, wherein the method comprises administering to a subject in need an effective amount of a Pyrenaria buisanensis extract.
44
TW201918256A
Use of green pear fruitlet extract for reducing heavy metals in the blood and improving the lung function
Publication/Patent Number: TW201918256A Publication Date: 2019-05-16 Application Number: 107137398 Filing Date: 2018-10-23 Inventor: Lin yu ting   Lin, Yung-hsiang   Assignee: TCI CO., LTD   IPC: A61P43/00 Abstract: The present invention provides a use of green pear fruitlet extract for reducing heavy metal in the blood and improving the lung function. The green pear fruitlet extract can effectively reduce the content of harmful heavy metals commonly found in air pollution, and can effectively improve the forced vital capacity (FVC) and the peak expiratory flow (PPEF), to reduce the airway resistance and to increase the expiratory flow. The green pear extract have the effect of preventing the harmful effects of harmful heavy metals, smoothing the breath and improving lung capacity on human bodies. The green pear fruitlet extract is prepared by extracting green pear fruitlet using water, alcohols, or mixtures of water and alcohols as solvents.
45
US2019142891A1
FERMENTATION PRODUCT OF MUNG BEAN HULL AND USES OF THE SAME
Publication/Patent Number: US2019142891A1 Publication Date: 2019-05-16 Application Number: 16/182,198 Filing Date: 2018-11-06 Inventor: Lin, Yung-hsiang   Lin yu ting   Assignee: TCI CO., LTD.   IPC: A61K36/48 Abstract: A fermentation product of mung bean hull and its uses are provided, wherein the fermentation product is provided by fermenting a mung bean hull and/or an extract of mung bean hull in the present of Lactobacillus plantarum. And, the fermentation product of mung bean hull is used for regulating blood sugar, assisting in regulation of blood pressure, assisting in regulation of blood lipid, preventing hypertension, reducing blood pressure, preventing hypertriglyceridemia, reducing blood lipid, preventing hyperglycemia, reducing blood sugar, preventing cardiovascular disease, treating cardiovascular disease, preventing diabetes, and/or treating diabetes.
46
TW201914575A
Use of earthworm extracts for preparing a pharmaceutical composition for skin conditioning
Publication/Patent Number: TW201914575A Publication Date: 2019-04-16 Application Number: 106132142 Filing Date: 2017-09-19 Inventor: Lin yu ting   Lin, Yung-hsiang   Assignee: TCI CO., LTD   IPC: A61Q19/00 Abstract: The present invention relates to a use of earthworm extracts. Particularly, the present invention provides a use of earthworm extracts for preparing a pharmaceutical composition which can decrease erythema content and pore size of the skin. As such, the pharmaceutical composition comprising the earthworm extracts has effects of calming, anti-sensitive, easing and anti-inflammation.
47
TW201918255A
Fermentation product of mung bean hull and uses of the same
Publication/Patent Number: TW201918255A Publication Date: 2019-05-16 Application Number: 107135019 Filing Date: 2018-10-04 Inventor: Lin yu ting   Lin, Yung-hsiang   Assignee: TCI CO., LTD.   IPC: C12R1/25 Abstract: A fermentation product of mung bean hull and its uses are provided, wherein the fermentation product is provided by subjecting the mung bean hull to a fermentation in the present of Lactobacillus plantarum. And, the fermentation product of mung bean hull is use for regulating blood sugar, assisting in regulation of blood pressure, assisting in regulation of blood lipid, or manufacturing a pharmaceutical composition. The pharmaceutical composition is for preventing hypertension, reducing blood pressure, preventing hypertriglyceridemia, reducing blood lipid, preventing hyperglycemia, reducing blood sugar, preventing cardiovascular disease, treating cardiovascular disease, preventing diabetes, and/or treating diabetes.
48
TW201900194A
Use of ascophyllum nodosum extracts for regulating expression of gene groups
Publication/Patent Number: TW201900194A Publication Date: 2019-01-01 Application Number: 107115303 Filing Date: 2018-05-04 Inventor: Lin yu ting   Lin, Yung-hsiang   Assignee: TCI CO., LTD.   IPC: A61P43/00 Abstract: The present invention provides uses of an Ascophyllum nodosum extract for manufacture of composition for regulating expression of a gene group, wherein the gene group includes a Group A gene selected from the group consisting of TGM1, KRT14, FLG, AQP3, GBA, HAS3, and combinations thereof, and a Group B gene selected from the group consisting of HAS2, MMP2, LOX, and combinations thereof. The Ascophyllum nodosum extract improves skin moisture, skin elasticity, and resistance to ultraviolet radiation.
49
TWI659997B
Chemically amplified positive photoresist composition
Publication/Patent Number: TWI659997B Publication Date: 2019-05-21 Application Number: 107104681 Filing Date: 2018-02-09 Inventor: Lin yu ting   Huang, Hsin-yi   Lee, Hsing-chieh   Assignee: EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION   IPC: G03F7/039 Abstract: A chemically amplified positive photoresist composition is disclosed, which comprises: (A) 15 to 30 parts by weight of an acrylate resin comprising monomers represented by the following formulas (1) to (3); and (B) 0.05 to 1 parts by weight of a photo-acid generator. Herein, R1 to R6 are defined in the specification.
50
TW201929888A
Use of Elsholtzia ciliata Hylander extracts for treating lung tissue damage and inhibiting pulmonary fibrosis
Publication/Patent Number: TW201929888A Publication Date: 2019-08-01 Application Number: 107143967 Filing Date: 2018-12-06 Inventor: Lin yu ting   Lin, Yung-hsiang   Li, Zih-yi   Assignee: TCI CO., LTD.   IPC: A61P11/00 Abstract: The present invention provides use of an Elsholtzia ciliata Hylander extract for manufacture of a pharmaceutical composition for treating lung tissue damage and inhibiting pulmonary fibrosis. The Elsholtzia ciliata Hylander extract is preferably prepared by extraction of Elsholtzia ciliata Hylander using water as solvents. Said extract improves the wound healing ability of lung epithelial cells, inhibits secretion of proinflammatory cytokines and enhances E-cadherin expression in lung epithelial cells, and reduces glycated protein formation.
51
TW201934646A
Chemically amplified positive photoresist composition
Publication/Patent Number: TW201934646A Publication Date: 2019-09-01 Application Number: 107104681 Filing Date: 2018-02-09 Inventor: Lin yu ting   Huang, Hsin-yi   Lee, Hsing-chieh   Assignee: EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION   IPC: G03F7/039 Abstract: A chemically amplified positive photoresist composition is disclosed, which comprises: (A) 15 to 30 parts by weight of an acrylate resin comprising monomers represented by the following formulas (1) to (3); and (B) 0.05 to 1 parts by weight of a photo-acid generator. Herein, R1 to R6 are defined in the specification.
52
TWI671432B
Conductive feature formation and structure
Publication/Patent Number: TWI671432B Publication Date: 2019-09-11 Application Number: 107116123 Filing Date: 2018-05-11 Inventor: Wang, Chun Chieh   Lin, Yu Ting   Huang, Huang Yi   Chang, Cheng Wei   Hung, Min Hsiu   Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.   IPC: H01L21/205 Abstract: Generally, the present disclosure provides example embodiments relating to conductive features, such as metal contacts, vias, lines, etc., and methods for forming those conductive features. In a method embodiment, a dielectric layer is formed on a semiconductor substrate. The semiconductor substrate has a source/drain region. An opening is formed through the dielectric layer to the source/drain region. A silicide region is formed on the source/drain region and a barrier layer is formed in the opening along sidewalls of the dielectric layer by a same Plasma-Enhance Chemical Vapor Deposition (PECVD) process.
53
TWI647791B
Methods of forming semiconductor structures
Publication/Patent Number: TWI647791B Publication Date: 2019-01-11 Application Number: 106135913 Filing Date: 2017-10-19 Inventor: Wang, Yu Sheng   Lin, Yu Ting   Liu, Hsiao Ping   Hsu, Hung Chang   Lin, Yuan Wen   Lu, Hung Pin   Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.   IPC: H01L21/768 Abstract: A method includes forming an Inter-layer Dielectric (ILD) having a portion at a same level as a metal gate of a transistor. The ILD and the metal gate are parts of a wafer. The ILD is etched to form a contact opening. The wafer is placed into a PVD tool, with a metal target in the PVD tool. The metal target has a first spacing from a magnet over the metal target, and a second spacing from the wafer. A ratio of the first spacing to the second spacing is greater than about 0.02. A metal layer is deposited on the wafer, with the metal layer having a bottom portion in the contact opening, and a sidewall portion in the contact opening. An anneal is performed to react the bottom portion of the metal layer with the source/drain region to form a silicide region.
54
TW201925525A
Conductive feature formation and structure
Publication/Patent Number: TW201925525A Publication Date: 2019-07-01 Application Number: 107116123 Filing Date: 2018-05-11 Inventor: Wang, Chun Chieh   Lin, Yu Ting   Huang, Huang Yi   Chang, Cheng Wei   Hung, Min Hsiu   Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.   IPC: H01L21/205 Abstract: Generally, the present disclosure provides example embodiments relating to conductive features, such as metal contacts, vias, lines, etc., and methods for forming those conductive features. In a method embodiment, a dielectric layer is formed on a semiconductor substrate. The semiconductor substrate has a source/drain region. An opening is formed through the dielectric layer to the source/drain region. A silicide region is formed on the source/drain region and a barrier layer is formed in the opening along sidewalls of the dielectric layer by a same Plasma-Enhance Chemical Vapor Deposition (PECVD) process.
55
KR20190062112A
CONDUCTIVE FEATURE FORMATION AND STRUCTURE
Publication/Patent Number: KR20190062112A Publication Date: 2019-06-05 Application Number: 20180034001 Filing Date: 2018-03-23 Inventor: Lin, Yu Ting   Hung, Min Hsiu   Chang, Cheng Wei   Huang, Huang Yi   Wang, Chun Chieh   Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.   IPC: H01L21/768 Abstract: Generally, the present invention provides example embodiments relating to conductive features, such as metal contacts, vias, lines, and the like, and methods for forming the conductive features. In an embodiment of the method of the present invention, a dielectric layer is formed on a semiconductor substrate. The semiconductor substrate has a source/drain region. An opening part is formed through the dielectric layer to the source/drain region. A silicide region is formed on the source/drain region and a barrier layer is formed in the opening part along sidewalls of the dielectric layer by a same plasma-enhance chemical vapor deposition (PECVD) process.
56
US2019178809A1
WORKPIECE SURFACE DETECTION METHOD AND SYSTEM USING THE SAME
Publication/Patent Number: US2019178809A1 Publication Date: 2019-06-13 Application Number: 16/275,891 Filing Date: 2019-02-14 Inventor: Chiu, Wei-yao   Hung, Kuo-feng   Lin yu ting   Chang, Keng-hao   Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   IPC: G01N21/88 Abstract: A detecting method for a workpiece surface includes the following steps. Firstly, a workpiece is provided with a first environment, wherein the first environment has a first environmental temperature higher than a first saturation temperature corresponding to an environmental-relative humidity. Then, the workpiece is provided with a second environment, wherein the second environment has a second environmental temperature lower than the first environmental temperature, such that a itself-temperature of the workpiece reduces to a mist temperature, wherein the mist temperature is substantially equal to or higher than the second environmental temperature. Then, the workpiece is provided with a mist environment, wherein the mist environment has a mist-saturation temperature corresponding to a mist-environmental relative humidity is equal to or higher than the mist temperature for misting a surface of the workpiece. Then, the surface of the misted workpiece is detected.
57
US10261025B2
Workpiece surface detection method and system using the same
Publication/Patent Number: US10261025B2 Publication Date: 2019-04-16 Application Number: 15/392,325 Filing Date: 2016-12-28 Inventor: Chiu, Wei-yao   Hung, Kuo-feng   Lin yu ting   Chang, Keng-hao   Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   IPC: G01N21/88 Abstract: A detecting method for a workpiece surface includes the following steps. Firstly, a workpiece is provided with a first environment, wherein the first environment has a first environmental temperature higher than a first saturation temperature corresponding to an environmental-relative humidity. Then, the workpiece is provided with a second environment, wherein the second environment has a second environmental temperature lower than the first environmental temperature, such that a itself-temperature of the workpiece reduces to a mist temperature, wherein the mist temperature is substantially equal to or higher than the second environmental temperature. Then, the workpiece is provided with a mist environment, wherein the mist environment has a mist-saturation temperature corresponding to a mist-environmental relative humidity is equal to or higher than the mist temperature for misting a surface of the workpiece. Then, the surface of the misted workpiece is detected.
58
US10391476B2
Inorganic nanofiber and method for manufacturing the same
Publication/Patent Number: US10391476B2 Publication Date: 2019-08-27 Application Number: 15/406,962 Filing Date: 2017-01-16 Inventor: Yeh, Ping-hung   Lai, Chun-yen   Lin yu ting   Pan, Pin-chun   Assignee: TAMKANG UNIVERSITY   IPC: B01J21/14 Abstract: An organic nanofiber includes a fiber body containing multiple inorganic oxide particles selected from polycrystalline titanium dioxide particles and polycrystalline tin(IV) oxide particles, and having a particle size ranging from 15 to 75 nm. A method for manufacturing the inorganic nanofibers, including: mixing a metal precursor, an organic polymer and a solvent to obtain a solution, the metal precursor being a titanium-containing precursor or a tin-containing precursor; electrospinning the solution at a relative humidity ranging from 50 to 60% to form multiple nanofibers; and annealing the nanofibers at a temperature ranging from 600 to 800° C. to obtain multiple inorganic nanofibers.
59
US10269926B2
Purging deposition tools to reduce oxygen and moisture in wafers
Publication/Patent Number: US10269926B2 Publication Date: 2019-04-23 Application Number: 15/246,071 Filing Date: 2016-08-24 Inventor: Liu, Yi-ying   Nieh, Chun-wen   Wang, Yu-sheng   Lin yu ting   Chen, Wei-yu   Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.   IPC: H01L21/02 Abstract: A method includes placing a wafer in a wafer holder, placing the wafer holder on a loadport of a deposition tool, connecting the wafer holder to a front-end interface unit of the deposition tool, purging the front-end interface unit with nitrogen, and depositing a metal layer on the wafer in the deposition tool.
60
DE102018100300A1
BILDEN EINES LEITFÄHIGEN MERKMALS UND EINER STRUKTUR
Publication/Patent Number: DE102018100300A1 Publication Date: 2019-05-29 Application Number: 102018100300 Filing Date: 2018-01-09 Inventor: Lin yu ting   Wang, Chun-chieh   Huang, Huang-yi   Chang, Cheng-wei   Hung, Min-hsiu   Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.   IPC: H01L21/3065 Abstract: Im Allgemeinen stellt die vorliegende Offenbarung beispielhafte Ausführungsformen in Zusammenhang mit leitfähigen Merkmalen, wie Metallkontakten, Durchkontaktierungen, Leitungen usw. sowie Verfahren zum Bilden dieser leitfähigen Merkmale bereit. Bei einer Verfahrensausführungsform wird eine dielektrische Schicht auf einem Halbleitersubstrat gebildet. Das Halbleitersubstrat hat einen Source/Drain-Bereich. Eine Öffnung wird durch die dielektrische Schicht zu dem Source/Drain-Bereich gebildet. Ein Silizidbereich wird auf dem Source/Drain-Bereich gebildet, und eine Sperrschicht wird in der Öffnung entlang von Seitenwänden der dielektrischen Schicht durch ein und denselben plasmaverstärkten chemischen Dampfabscheidungs- (PECVD)-Prozess gebildet.
Total 26 pages