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No. Publication Number Title Publication/Patent Number Publication/Patent Number Publication Date Publication Date
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1
TWI309250B
Photoresist cleaning reagent
Publication/Patent Number: TWI309250B Publication Date: 2009-05-01 Application Number: 94108191 Filing Date: 2005-03-17 Inventor: Wu, Zong-han   Liu, Xing-ji   Xiang yong rui   Zhou, Shi-ming   Lu, Xin-xin   Assignee: Au Optronics Corporation   LEE CHANG YUNG CHEMICAL INDUSTRY CORPORATION   IPC: C08L61/02 Abstract: The invention provides a photoresist cleaning reagent for rinsing phtoresist and particularly for rinsing PIGMENT DISPERSE photoresist used in the manufacture of a color filter. The photoresist cleaning reagent of the invention comprises 10 to 90wt% of cyclohexanone and 90 to 10wt% of propylene glycol monomethyl ethers acetates (PGMEA)
2
TW200634088A
Photoresist cleaning reagent
Publication/Patent Number: TW200634088A Publication Date: 2006-10-01 Application Number: 94108191 Filing Date: 2005-03-17 Inventor: Wu, Zong-han   Liu, Xing-ji   Xiang yong rui   Zhou, Shi-ming   Lu, Xin-xin   Assignee: Au Optronics Corporation   LEE CHANG YUNG CHEMICAL INDUSTRY CORPORATION   IPC: C08L61/02 Abstract: The invention provides a photoresist cleaning reagent for rinsing phtoresist and particularly for rinsing PIGMENT DISPERSE photoresist used in the manufacture of a color filter. The photoresist cleaning reagent of the invention comprises 10 to 90wt% of cyclohexanone and 90 to 10wt% of propylene glycol monomethyl ethers acetates (PGMEA)