| No. | Publication Number | Title | Publication/Patent Number Publication/Patent Number |
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1 | TWI309250B |
Photoresist cleaning reagent
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Publication/Patent Number: TWI309250B | Publication Date: 2009-05-01 | Application Number: 94108191 | Filing Date: 2005-03-17 | Inventor： Wu, Zong-han Liu, Xing-ji Xiang yong rui Zhou, Shi-ming Lu, Xin-xin | Assignee: Au Optronics Corporation LEE CHANG YUNG CHEMICAL INDUSTRY CORPORATION | IPC: C08L61/02 | Abstract: The invention provides a photoresist cleaning reagent for rinsing phtoresist and particularly for rinsing PIGMENT DISPERSE photoresist used in the manufacture of a color filter. The photoresist cleaning reagent of the invention comprises 10 to 90wt% of cyclohexanone and 90 to 10wt% of propylene glycol monomethyl ethers acetates (PGMEA) | ||
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2 | TW200634088A |
Photoresist cleaning reagent
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Publication/Patent Number: TW200634088A | Publication Date: 2006-10-01 | Application Number: 94108191 | Filing Date: 2005-03-17 | Inventor： Wu, Zong-han Liu, Xing-ji Xiang yong rui Zhou, Shi-ming Lu, Xin-xin | Assignee: Au Optronics Corporation LEE CHANG YUNG CHEMICAL INDUSTRY CORPORATION | IPC: C08L61/02 | Abstract: The invention provides a photoresist cleaning reagent for rinsing phtoresist and particularly for rinsing PIGMENT DISPERSE photoresist used in the manufacture of a color filter. The photoresist cleaning reagent of the invention comprises 10 to 90wt% of cyclohexanone and 90 to 10wt% of propylene glycol monomethyl ethers acetates (PGMEA) |
3.Current Quota