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No. Publication Number Title Publication/Patent Number Publication/Patent Number Publication Date Publication Date
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1
CN212723652U
一种方便存放的显影机
Grant
Publication/Patent Number: CN212723652U Publication Date: 2021-03-16 Application Number: 202021157235.9 Filing Date: 2020-06-19 Inventor: 王艳荣   Assignee: 西安兄弟印刷包装有限公司   IPC: G03F7/26 Abstract: 本申请涉及一种方便存放的显影机,其包括机体,所述机体一端开设入料口,另一端开设出料口,所述入料口和出料口处均设置有支撑板,所述支撑板转动设置于机体上,所述机体于入料口和出料口处均安装有铰接座,支撑板上固设有转轴,支撑板通过转轴在铰接座上转动。本申请具有支撑板能够转动节省存放空间的效果。
2
CN212694247U
基板处理装置
Grant
Publication/Patent Number: CN212694247U Publication Date: 2021-03-12 Application Number: 202021909494.2 Filing Date: 2020-09-04 Inventor: 田岛直树   Assignee: 东京毅力科创株式会社   IPC: G03F7/26 Abstract: 本实用新型提供一种基板处理装置。在具有多个处理单元的基板处理装置中减少向各处理单元供给的清洁的空气的温度、湿度的单元间差异。一种基板处理装置,其具有多个处理基板的处理单元,其中,该基板处理装置具有向所述处理单元供给空气的多个管道,在各所述管道具有连结该管道和空气的供给源的连接管,所述多个管道连接有数量互不相同的所述处理单元,所述管道内的空气的流速和经由所述连接管向所述管道供给的空气的流速中的至少任一者在所述管道之间相等。
3
CN112485981A
基板处理装置和空气供给方法
Public
Publication/Patent Number: CN112485981A Publication Date: 2021-03-12 Application Number: 202010919558.5 Filing Date: 2020-09-04 Inventor: 田岛直树   Assignee: 东京毅力科创株式会社   IPC: G03F7/26 Abstract: 本发明提供一种基板处理装置和空气供给方法。在具有多个处理单元的基板处理装置中减少向各处理单元供给的清洁的空气的温度、湿度的单元间差异。一种基板处理装置,其具有多个处理基板的处理单元,其中,该基板处理装置具有向所述处理单元供给空气的多个管道,在各所述管道具有连结该管道和空气的供给源的连接管,所述多个管道连接有数量互不相同的所述处理单元,所述管道内的空气的流速和经由所述连接管向所述管道供给的空气的流速中的至少任一者在所述管道之间相等。
4
CN212433583U
一种精密晒版机用环保节能的涂粉装置
Grant
Publication/Patent Number: CN212433583U Publication Date: 2021-01-29 Application Number: 202021567454.4 Filing Date: 2020-08-01 Inventor: 姚辉   Assignee: 青岛同嘉盈印务有限公司   IPC: G03F7/26 Abstract: 本实用新型提供一种精密晒版机用环保节能的涂粉装置,包括储粉盒和固定在储粉盒下端的空心板,所述储粉盒一侧设有丝杆,所述丝杆上套设有滚珠螺母副,所述滚珠螺母副与储粉盒固定连接,所述丝杆一端连接电机输出端,所述丝杆远离电机的一端滚动连接有支板,所述支板一面对称固定有两个第一固定板,所述第一固定板一面开设有螺纹通孔,所述螺纹通孔内螺纹连接有调节螺栓,所述调节螺栓一端滚动连接有第二固定板,所述第二固定板一端固定连接有与支板相平齐的活动板,所述活动板一侧面开设有用于穿插螺丝的圆孔,与现有技术相比,本实用新型具有如下的有益效果:实现平稳控制储粉盒移动,提高稳定性。
5
CN112305861A
制造半导体装置的方法
Public
Publication/Patent Number: CN112305861A Publication Date: 2021-02-02 Application Number: 201911366280.7 Filing Date: 2019-12-26 Inventor: 郭宏瑞   李明潭   李兴杰   Assignee: 台湾积体电路制造股份有限公司   IPC: G03F7/16 Abstract: 在光刻胶成像期间,利用单层工艺来减少摆动效应干扰及反射。向光刻胶中加入了抗反射添加剂,其中所述抗反射添加剂具有染料部分及反应部分。在分配时,反应部分将与下伏结构反应,以在下伏结构与光刻胶的剩余部分之间形成抗反射涂层。在成像期间,抗反射涂层将吸收能量从而防止能量被反射,或将改变反射的光学路径从而有助于减少由反射能量导致的干扰。
6
US10962883B2
Method for manufacturing light guide elements
Publication/Patent Number: US10962883B2 Publication Date: 2021-03-30 Application Number: 16/684,955 Filing Date: 2019-11-15 Inventor: Fidric, Bernard   Droz, Pierre-yves   Hutchison, David   Assignee: Waymo LLC   IPC: G03F7/26 Abstract: Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example method includes overlaying a first mask on a photoresist material and a substrate, and causing a light source to illuminate the photoresist material through the first mask during a first exposure so as to define a first feature. During the first exposure, the light source is positioned at a non-normal angle with respect to a plane parallel to the substrate. The method includes developing the photoresist material so as to retain an elongate portion of the photoresist material on the substrate. A first end of the elongate portion includes an angled portion that is sloped at an angle with respect to a long axis of the elongate portion. The method also includes depositing a reflective material through a second mask onto the angled portion.
7
US2021018842A1
FLEXIBLE SUBSTRATE AND MANUFACTURING METHOD OF SAME
Publication/Patent Number: US2021018842A1 Publication Date: 2021-01-21 Application Number: 16/642,025 Filing Date: 2019-12-24 Inventor: Ding, Feng   Assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.   IPC: G03F7/20 Abstract: The present application provides a flexible substrate and a manufacturing method of the flexible substrate. The flexible substrate includes a first flexible layer, a barrier layer, a second flexible layer, and a buffer layer. The barrier layer is disposed on a surface of the first flexible layer, the barrier layer includes a first bending resistant structure disposed therein, the second flexible layer is disposed on a surface of the barrier layer, the buffer layer is disposed on a surface of the second flexible layer, and the buffer layer includes a second bending resistant structure disposed therein.
8
CN212848338U
一种晶圆传递装置及具有其的光阻涂布显影设备
Grant
Publication/Patent Number: CN212848338U Publication Date: 2021-03-30 Application Number: 202021142443.1 Filing Date: 2020-06-18 Inventor: 许志雄   Assignee: 芯米(厦门)半导体设备有限公司   IPC: H01L21/677 Abstract: 本实用新型公开了一种晶圆传递装置,其利用第一机械臂传递处于高温状态的晶圆,利用第二机械臂传递处于冷却状态的晶圆,这样避免了同一个机械臂既传递处于高温状态的晶圆又传递处于冷却状态的晶圆,进而提高晶圆在各工艺步骤过程中的温度稳定性和均一性;同时减少了一个任务周期内单个机械臂运转的次数,从而延长了单个机械臂的使用期限,也即延长了整个晶圆传递装置的使用期限,提升了半导体生产的稳定性、效率及产品良率;将该晶圆传递装置运用到光阻涂布显影设备中,与光阻涂布显影设备的多层机架配合,多层机架上沿竖直方向设有冷却盘单元、热盘单元,对应第一机械臂和第二机械臂,配合作业,实现了设备整体的高契合度。
9
CN212302209U
大网版丝网曝光显影装置
Grant
Publication/Patent Number: CN212302209U Publication Date: 2021-01-05 Application Number: 202021087152.7 Filing Date: 2020-06-13 Inventor: 谷云斌   Assignee: 常州普雷特印刷科技有限公司   IPC: G03F7/20 Abstract: 本实用新型涉及提供一种大网版丝网曝光显影装置,包括大网版,所述大网版设有待印刷区域;感光胶层,涂刷于大网版上,并覆盖待印刷区域表面;菲林,正对大网版的待印刷区域,并贴合在感光胶层上;透明片板,覆盖与菲林上,所述透明片板的四周均超出菲林的边缘;胶带,粘附在透明片板四周,并与四周的感光胶层粘接,以使透明片板与感光胶层之间形成密闭空间;抽真空装置,适于对密闭空间进行抽真空,以使透明片板压紧菲林紧密贴合大网版;曝光装置,适于透过透明片板将菲林上的图案转移至大网版的待印刷区域。可以在网版尺寸超过曝光机尺寸的情况下,对大网版上的目标印刷区域进行图案曝光显影,使印刷的图案清晰完整。
10
CN112379579A
基板冷热处理装置
Substantial Examination
Publication/Patent Number: CN112379579A Publication Date: 2021-02-19 Application Number: 202011244572.6 Filing Date: 2020-11-10 Inventor: 张存   Assignee: 芯米(厦门)半导体设备有限公司   IPC: G03F7/26 Abstract: 本发明涉及基板处理技术领域,具体为一种基板冷热处理装置,包括支撑杆、下支撑板、上支撑板、框架、水箱、加热器以及空调,所述支撑杆位于下支撑板的下端,所述上支撑板位于下支撑板的上端,所述下支撑板上设有第二电热管、支撑部以及冷凝管,并且所述上支撑板与下支撑板之间设有连接杆,通过支撑杆支撑下支撑板,通过连接杆使上支撑板固定在下支撑板的上端,所述框架、水箱、加热器以及空调均位于下支撑板的左侧,所述水箱位于框架的底端,所述加热器安装在水箱的上端,所述空调安装在加热器的上端,通过加热器使第二电热管进行加热,通过水箱使冷凝管具有冷却的效果,通过支撑部支撑基板,使基板固定。
11
CN112512811A
具有输送系统的用于处理凸版板前体的装置和方法
Substantial Examination
Publication/Patent Number: CN112512811A Publication Date: 2021-03-16 Application Number: 201980043892.4 Filing Date: 2019-04-23 Inventor: 巴尔特·瓦特恩   Assignee: 赛康印前公众有限公司   IPC: B41C1/02 Abstract: 一种用于处理凸版板前体的装置(1000),优选地,装置(1000)使用液体处理凸版板前体,凸版板前体例如是印刷版前体(P),装置(1000)包括:输送系统(210、220、230),其具有至少一个输送杆(100),优选地,具有至少两个输送杆(100);板联接工位(300),其配置为将凸版板前体联接至输送杆;处理室(400),其配置为用于处理凸版板前体;板分离工位(500),其配置为使处理后的凸版板前体与输送杆分离;其中,输送系统配置为在每个输送杆于板联接工位中联接至凸版板前体之后,自动地将每个输送杆从板联接工位穿过处理工位移动至板分离工位,并且在每个输送杆与处理后的凸版板前体分离之后,使每个输送杆从板分离工位返回至板联接工位,从而使输送杆以闭环方式移动通过装置。
12
CN212720078U
涂胶显影设备专用恒温恒湿设备
Grant
Publication/Patent Number: CN212720078U Publication Date: 2021-03-16 Application Number: 202021227809.5 Filing Date: 2020-06-29 Inventor: 李超   Assignee: 西安稳能微电子科技有限公司   IPC: F24F5/00 Abstract: 本实用新型涉及工业领域,尤其涉及涂胶显影设备专用恒温恒湿设备。涂胶显影设备进行热交换完成的升温纯水通过管道连接集合水箱(5),集合水箱(5)连接热交换器(4),厂务端工业纯水进入端(1)也连接热交换器(4),涂胶显影设备进行热交换完成的升温纯水与厂务端工业纯水进入端(1)来的低温工业纯水在热交换器(4)中能够进行热交换,热交换完成后的目标控制纯水能够从厂务端工业纯水出水端(2)流出,流出后能够通过管道流动到加热水箱(6),该连接加热水箱(6)的管道上包含温度传感器(3)。1.缩短热交换完成后升温的纯水降温速度。2。缩短总体纯水降温加热的速度。3.提高精密度。
13
EP3435157B1
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, METHOD FOR PRODUCING ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE PRODUCING METHOD
Publication/Patent Number: EP3435157B1 Publication Date: 2021-01-06 Application Number: 17769861.0 Filing Date: 2017-03-03 Inventor: Nihashi, Wataru   Tsubaki, Hideaki   Assignee: FUJIFILM Corporation   IPC: G03F7/004
14
EP3784494A1
APPARATUS AND METHOD FOR TREATING A RELIEF PLATE PRECURSOR HAVING A TRANSPORT SYSTEM
Publication/Patent Number: EP3784494A1 Publication Date: 2021-03-03 Application Number: 19720812.7 Filing Date: 2019-04-23 Inventor: Wattyn, Bart   Assignee: Xeikon Prepress N.V.   IPC: B41C1/02
15
EP3811398A1
AN APPARATUS AND METHOD FOR THE MINIMIZATION OF UNDERCUT DURING A UBM ETCH PROCESS
Publication/Patent Number: EP3811398A1 Publication Date: 2021-04-28 Application Number: 19823023.7 Filing Date: 2019-06-20 Inventor: Taddei, John   Goldberg, David A.   Lawrence, Elena   Cochran, Ian   Orlando, Christopher   Swallow, James   Assignee: Veeco Instruments, Inc.   IPC: H01L21/02
16
CN112440549A
减少复合边漏墨的复合材质网版及其制作方法
Substantial Examination
Publication/Patent Number: CN112440549A Publication Date: 2021-03-05 Application Number: 201910828708.9 Filing Date: 2019-09-03 Inventor: 蔡富得   陈欣彣   Assignee: 仓和精密制造(苏州)有限公司   仓和股份有限公司   IPC: B41F15/36 Abstract: 一种减少复合边漏墨的复合材质网版及其制作方法,包括:一网框;一复合网,包括一刮刀面与一贴印面,且所述复合网包括:一第一材质网,固定于所述网框上,且所述第一材质网上包括一预定结合区;以及一第二材质网,通过一膜层与所述第一材质网结合,所述第一材质网与所述第二材质网结合之处形成一复合边,且所述第二材质网上包括一图形区图案;以及一防漏层,结合在所述复合网的所述贴印面上并结合至所述预定结合区,以通过所述防漏层包覆住所述复合边,且所述防漏层上对应所述图形区图案的位置处包括对应所述图形区图案的一图案。本发明的方案使浆料/印刷油墨在网版印刷时不会从两种材质网布的结合处溢出。
17
EP3784493A1
APPARATUS AND METHOD FOR TREATING AND TRANSPORTING A RELIEF PRINTING PLATE PRECURSOR
Publication/Patent Number: EP3784493A1 Publication Date: 2021-03-03 Application Number: 19720811.9 Filing Date: 2019-04-23 Inventor: Wattyn, Bart   Assignee: Xeikon Prepress N.V.   IPC: B41C1/02
18
CN112672883A
用于处理和输送凸版印刷版前体的装置和方法
Public
Publication/Patent Number: CN112672883A Publication Date: 2021-04-16 Application Number: 201980043887.3 Filing Date: 2019-04-23 Inventor: 巴尔特·瓦特恩   Assignee: 赛康印前公众有限公司   IPC: B41C1/02 Abstract: 一种用于制备需处理的凸版板前体的装置(1000),该凸版板前体例如是印刷版前体(P),该装置(1000)包括:输送杆(100),其设置有至少一个穿透元件(110),优选地,设置有多个穿透元件;板联接工位(300),其配置为通过使至少一个穿透元件穿过凸版板前体的边缘附近的未穿孔区域来将凸版板前体联接至输送杆。
19
US2021041786A1
Photolithography for Making Electrochemical Measurements
Publication/Patent Number: US2021041786A1 Publication Date: 2021-02-11 Application Number: 17/077,214 Filing Date: 2020-10-22 Inventor: Policastro, Steven A.   Auyeung, Raymond C Y   Piqué, Alberto   Martin, Farrel   Assignee: The Government of the United States of America, as represented by the Secretary of the Navy   IPC: G03F7/20 Abstract: An apparatus for electrochemical experimentation with an isolated microstructural region on a surface comprising a metal sample coated with a photoresist, a region of interest, a light source, comprising optoelectronic devices such as spatial light modulators or digital micromirror devices for direct modulation of the light distribution itself and avoiding the use of a mask, wherein the exposed region is created by light from the light source and wherein the metal sample is immersed.
20
US10890373B2
Panel cooling device and buffer tank for the same
Publication/Patent Number: US10890373B2 Publication Date: 2021-01-12 Application Number: 15/752,569 Filing Date: 2018-01-24 Inventor: Shen, Teng   Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.   IPC: G03F7/26 Abstract: A buffer tank for panel cooling device is provided and includes a tank body and a carry mechanism provided in the tank body. The carry mechanism has a first slide rail, a second slide rail and a plurality of supporting frames, the first slide rail and the second slide rail are opposite to each other and fixed in the tank body, the supporting frames are arranged on the first slide rail and the second slide rail, and the supporting frames are configured to be moveable relative to the first slide rail and the second slide rail. In the disclosure, the fixed supporting frame in the buffer tank is changed to be a supporting frame intelligently driven to scroll. When cleaning and maintaining the buffer tank or handling the buffer tank fragments, the supporting frames are rolled together and are all abutted to provide enough working space to enhance operation safety.
Total 500 pages