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1
WO2010123045A1
Publication/Patent Number: WO2010123045A1
Publication date: 2010-10-28
Application number: 2010057106
Filing date: 2010-04-15
Abstract: An electrophotographic photosensitive member is disclosed which has a change layer consisting of five or more a-SiC intermediate layers
2
WO2009142164A1
Publication/Patent Number: WO2009142164A1
Publication date: 2009-11-26
Application number: 2009059110
Filing date: 2009-05-12
Abstract: Disclosed is an electrophotographic photoreceptor for negative electrification that is free from a problem of an increase in residual potential and does not cause an insulation breakdown-derived pinhole even under two-component development conditions that can satisfy a high image quality required on a quick printing market.  Also disclosed are a method for image formation and an electrophotographic apparatus using the electrophotographic photoreceptor for negative electrification.  In the electrophotographic photoreceptor Disclosed is an electrophotographic photoreceptor for negative electrification that is free from a problem of an increase in residual potential and does not cause an insulation breakdown-derived pinhole even under two-component development conditions that can satisfy a high ...more ...less
3
WO2006019190A1
Publication/Patent Number: WO2006019190A1
Publication date: 2006-02-23
Application number: 2005015387
Filing date: 2005-08-18
IPC:
Abstract: A method for producing an electrophotographic photosensitive body for negative charging capable of enhancing adhesion between first and second layers without lowering the effect of reducing image defect while reducing total cost
4
WO2006049340A1
Publication/Patent Number: WO2006049340A1
Publication date: 2006-05-11
Application number: 2005020766
Filing date: 2005-11-07
Abstract: An electrophotographic photoreceptor that while minimizing the absorption of imagewise exposure of 380 to 500 nm wavelength at a surface layer thereof
5
WO2006062256A1
Publication/Patent Number: WO2006062256A1
Publication date: 2006-06-15
Application number: 2005023094
Filing date: 2005-12-09
Abstract: An electrophotographic photoreceptor that while minimizing an absorption of short-wavelength image exposure at its surface layer
6
WO2006062260A1
Publication/Patent Number: WO2006062260A1
Publication date: 2006-06-15
Application number: 2005023188
Filing date: 2005-12-12
Abstract: An electrophotographic photoreceptor that while minimizing an absorption of short-wavelength image exposure at its surface layer
7
WO2006049327A1
Publication/Patent Number: WO2006049327A1
Publication date: 2006-05-11
Application number: 2005020671
Filing date: 2005-11-04
Abstract: A photosensitive layer exhibiting high sensitivity to wavelengths of about 380 to 500 nm; an electrophotographic photoreceptor that exhibits substantially no absorption of such wavelengths
8
US2005153223A1
Publication/Patent Number: US2005153223A1
Publication date: 2005-07-14
Application number: 10/630,772
Filing date: 2003-07-31
Abstract: An electrophotographic photosensitive member production process is provided having the steps of placing a cylindrical substrate having a conductive surface in a first film-forming chamber, and decomposing a source gas with high-frequency power to deposit on the cylindrical substrate a first layer formed of a non-single-crystal material, taking out of the first film-forming chamber the cylindrical substrate with the first layer deposited thereon, and placing the cylindrical substrate with the first layer deposited thereon in a second film-forming chamber, and decomposing a source gas with a high-frequency power to deposit on the first layer a second layer having an upper-part blocking layer formed of a non-single-crystal material. Even where abnormal growth portions called spherical protuberances are present on the photosensitive member surface, they can be made not to appear on images, and image defects can vastly be remedied. An electrophotographic photosensitive member production process is provided having the steps of placing a cylindrical substrate having a conductive surface in a first film-forming chamber, and decomposing a source gas with high-frequency power to deposit on the cylindrical ...more ...less
9
US2004209179A1
Publication/Patent Number: US2004209179A1
Publication date: 2004-10-21
Application number: 10/636,691
Filing date: 2003-08-08
Abstract: In an electrophotographic photosensitive member comprising a conductive substrate, and provided thereon a photoconductive layer containing at least an amorphous material composed chiefly of silicon atoms and, deposited on the photoconductive layer, a layer region containing an amorphous material composed chiefly of silicon atoms, which layer region contains at least partly a periodic-table Group 13 element, the content of the periodic-table Group 13 element based on the total amount of constituent atoms in the layer region deposited on the photoconductive layer has distribution having at least any two of maximum value(s) and maximum region(s) in the thickness direction of the layer region. This electrophotographic photosensitive member can be improved in charging performance, can prevent image defects due to pressure mars and can form high-quality images over a long period of time. In an electrophotographic photosensitive member comprising a conductive substrate, and provided thereon a photoconductive layer containing at least an amorphous material composed chiefly of silicon atoms and, deposited on the photoconductive layer, a layer region containing an ...more ...less
10
US2004083974A1
Publication/Patent Number: US2004083974A1
Publication date: 2004-05-06
Application number: 10/691,514
Filing date: 2003-10-24
Abstract: For enhancing plasma uniformity and long-term stability so as to readily form a film with excellent uniformity of thickness and quality and with good repeatability and for suppressing occurrence of image defects and drastically increasing the yield to form a deposited film ready for volume production, particularly, a functional deposit film (for example, an amorphous semiconductor used for semiconductor devices, electrophotographic photosensitive members, photovoltaic devices, and so on) is formed in an apparatus including a reaction vessel which can be hermetically evacuated, a substrate holder in the reaction vessel, a source gas supply, a power supply for high-frequency power. An end covering member is provided at an end of each of the substrate holder, the source gas supply and the power supply. For enhancing plasma uniformity and long-term stability so as to readily form a film with excellent uniformity of thickness and quality and with good repeatability and for suppressing occurrence of image defects and drastically increasing the yield to form a deposited film ready ...more ...less
11
US2004071890A1
Publication/Patent Number: US2004071890A1
Publication date: 2004-04-15
Application number: 10/630,727
Filing date: 2003-07-31
Abstract: The invention provides a method for producing an electrophotographic photosensitive member such that even if abnormal grown portions called spherical protrusions 203 exist on the surface of the photosensitive member, they do not appear on images, thus making it possible to considerably alleviate image defects. The method for producing the electrophotographic photosensitive member including layers each constituted by a non-single crystal material includes the steps of placing a substrate having a conductive surface in a film forming apparatus capable of being airtight-sealed under vacuum having evacuating means and raw material gas supplying means, and decomposing at least a raw material gas by a high frequency power to form a first layer constituted by at least a non-single crystal material on the substrate as a first step; exposing the substrate with the first layer formed thereon to a gas containing oxygen and water vapor as a second step; and decomposing at least a raw material gas by a high frequency power in the film forming apparatus to form on the first layer a second layer including an upper blocking layer constituted by a non-single crystal material as a third step. The invention provides a method for producing an electrophotographic photosensitive member such that even if abnormal grown portions called spherical protrusions 203 exist on the surface of the photosensitive member, they do not appear on images, thus making it possible to ...more ...less
12
US2003124449A1
Publication/Patent Number: US2003124449A1
Publication date: 2003-07-03
Application number: 10/180,049
Filing date: 2002-06-27
Abstract: A process for manufacturing an electrophotographic photosensitive member is disclosed in which a source gas is decomposed by the use of a high-frequency power in a rector to deposit sequentially on a conductive substrate i) a photoconductive layer comprised of an amorphous material composed chiefly of silicon atoms and ii) a surface layer comprised of an amorphous material composed chiefly of carbon atoms and containing hydrogen atoms. The process has the steps of forming the photoconductive layer in a first reactor, and forming the surface layer in a second reactor. This process can produce an electrophotographic photosensitive member having an a-Si photoconductive layer and a-C:H surface layer or a-C:H(Si) surface layer in a good efficiency and at a low cost. Also disclosed is an electrophotographic photosensitive member manufacturing apparatus which carries out the process. A process for manufacturing an electrophotographic photosensitive member is disclosed in which a source gas is decomposed by the use of a high-frequency power in a rector to deposit sequentially on a conductive substrate i) a photoconductive layer comprised of an amorphous ...more ...less
13
US2003104293A1
Publication/Patent Number: US2003104293A1
Publication date: 2003-06-05
Application number: 10/127,593
Filing date: 2002-04-23
Abstract: A negative-charging electrophotographic photosensitive member comprising an aluminum-based substrate and a silicate film and a light-receiving layer in this order. The silicate film has a layer thickness of 0.5 nm to 15 nm and comprises at least aluminum atoms, silicon atoms and oxygen atoms. The light-receiving layer has at least a lower-part charge injection blocking layer formed of a non-single crystal silicon film comprising at least silicon atoms, nitrogen atoms and oxygen atoms, not doped with any impurities, a photoconductive layer formed of a non-single crystal silicon film comprising at least silicon atoms, an upper-part charge injection blocking layer formed of a non-single crystal silicon film comprising at least silicon atoms, carbon atoms and atoms belonging to the Group 13 of the periodic table, and a surface protective layer formed of a non-single crystal silicon film comprising at least silicon atoms and containing carbon atoms. A negative-charging electrophotographic photosensitive member comprising an aluminum-based substrate and a silicate film and a light-receiving layer in this order. The silicate film has a layer thickness of 0.5 nm to 15 nm and comprises at least aluminum atoms, silicon atoms and ...more ...less
14
US2002098438A1
Publication/Patent Number: US2002098438A1
Publication date: 2002-07-25
Application number: 09/987,507
Filing date: 2001-11-15
Abstract: In an image-forming apparatus having at least i) an electrophotographic photosensitive member having at least a photoconductive layer and a surface layer on a conductive substrate, ii) a developing means having a toner, and iii) a charging means, the photoconductive layer comprises a non-single-crystal material composed chiefly of silicon, the surface layer comprises a non-single-crystal carbon film containing at least hydrogen and has an arithmetic-mean roughness Ra ranging from 0 nm to 100 nm in an extent of 10 &mgr;m×10 &mgr;m of the surface layer, the charging mean is a magnetic-brush charging assembly or an elastic-roller charging assembly holding thereon a conductive fine powder, and the toner is a magnetic toner having toner particles containing at least a binder resin and a magnetic material, and an inorganic fine powder, having an average circularity of from 0.950 to 1.000, and having a saturation magnetization of from 10 to 50 Am2/kg (emu/g) under application of a magnetic field of 79.6 kA/m (1,000 oersteds). Also disclosed is an image-forming method. In an image-forming apparatus having at least i) an electrophotographic photosensitive member having at least a photoconductive layer and a surface layer on a conductive substrate, ii) a developing means having a toner, and iii) a charging means, the photoconductive layer ...more ...less
15
US2002115012A1
Publication/Patent Number: US2002115012A1
Publication date: 2002-08-22
Application number: 09/987,228
Filing date: 2001-11-14
Abstract: In an image-forming apparatus having at least i) an electrophotographic photosensitive member having at least a photoconductive layer and a surface layer on a conductive substrate, ii) a developing means having a toner, and iii) a charging means, the photoconductive layer comprises a non-single-crystal material composed chiefly of silicon, the surface layer comprises a non-single-crystal carbon film containing at least hydrogen and has a dynamic hardness in the range of from 4.90×109 to 1.76×1010 Pa (500 to 1,800 kgf/mm2), the charging means has a charging member kept in contact with the electrophotographic photosensitive member, forming a contact zone therewith, charges the electrophotographic photosensitive member electrostatically upon application of a voltage, and the toner is a magnetic toner having toner particles containing at least a binder resin and a magnetic material, and an inorganic fine powder, having an average circularity of from 0.950 to 1.000, and having a saturation magnetization of from 10 to 50 Am2/kg (emu/g) under application of a magnetic field of 79.6 kA/m (1,000 oersteds). Also disclosed is an image-forming method. In an image-forming apparatus having at least i) an electrophotographic photosensitive member having at least a photoconductive layer and a surface layer on a conductive substrate, ii) a developing means having a toner, and iii) a charging means, the photoconductive layer ...more ...less
16
US2002038632A1
Publication/Patent Number: US2002038632A1
Publication date: 2002-04-04
Application number: 09/899,188
Filing date: 2001-07-06
Abstract: In a plasma treatment method of and apparatus for treating the surface of a treatment target substrate by utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means, a plurality of impedance regulation means for regulating impedances on the side of the reactor and on the side of the high-frequency power supply means are provided correspondingly to the impedances of a plurality of reactors, and the high-frequency power is supplied into the reactors via the impedance regulation means corresponding to the reactors. Plasma treatment can be made in a good efficiency and a low cost on a plurality of reactors having different impedances. In a plasma treatment method of and apparatus for treating the surface of a treatment target substrate by utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means, a plurality of impedance ...more ...less
17
US2002038630A1
Publication/Patent Number: US2002038630A1
Publication date: 2002-04-04
Application number: 09/851,552
Filing date: 2001-05-10
Abstract: In order to make possible formation of a deposited film of a relatively large area at a treatment rate which could not accomplished by the plasma process of the prior art, and in order to make possible stable production of the deposited film without variation in film quality, in an apparatus and a method for forming a deposited film, a part of a reaction vessel is formed of a dielectric member, at least one high-frequency electrode is arranged so as to face at least one substrate with interposition of the dielectric member, an earth shield is arranged so as to cover the reaction vessel and the high-frequency electrode, plasma is generated between the high-frequency electrode and the substrate, and a deposited film is formed under the conditions in which the following equation: 0.8×(&egr;2/d3)<1/(d1/&egr;1&plus;d2/&egr;2) is satisfied where d1 is the thickness of the dielectric member, d2 is the distance from the surface of the high-frequency electrode to the dielectric member, d3 is the distance from the surface of the high-frequency electrode to the inside surface of the earth shield, &egr;1 is a dielectric constant of the dielectric member, and &egr;2 is a dielectric constant of a space between the reaction vessel and the earth shield. In order to make possible formation of a deposited film of a relatively large area at a treatment rate which could not accomplished by the plasma process of the prior art, and in order to make possible stable production of the deposited film without variation in film quality, in ...more ...less
18
US2002029818A1
Publication/Patent Number: US2002029818A1
Publication date: 2002-03-14
Application number: 09/842,154
Filing date: 2001-04-26
Abstract: For making it feasible to suit to vacuum processing utilizing a system consisting of an exhaust section and a separable vacuum processing vessel section, to ensure flexibility of production, to prevent dust from attaching onto an article, so as to achieve increase in non-defective percentage of vacuum-processed articles, and also to suppress variability in vacuum processing characteristics among lots, an article is loaded into a movable vacuum processing vessel section, the vacuum processing vessel section is preliminarily pressure-reduced and moved, the vacuum processing vessel section is connected to an exhaust section, and communication is established between the vacuum processing vessel section and the exhaust section to perform vacuum processing. A first opening provided in the vacuum processing vessel section is connected to a second opening provided in the exhaust section and a vacuum seal valve of the first opening which is openable and closable, is opened. When opening the valve, the internal pressure of the vacuum processing vessel under reduced pressure is set higher than the pressure of another pressure-reduced space to be brought into communication therewith by the opening of the valve. For making it feasible to suit to vacuum processing utilizing a system consisting of an exhaust section and a separable vacuum processing vessel section, to ensure flexibility of production, to prevent dust from attaching onto an article, so as to achieve increase in ...more ...less
19
US2002100421A1
Publication/Patent Number: US2002100421A1
Publication date: 2002-08-01
Application number: 10/046,318
Filing date: 2002-01-16
Abstract: For enhancing plasma uniformity and long-term stability so as to readily form a film with excellent uniformity of thickness and quality and with good repeatability and for suppressing occurrence of image defects and drastically increasing the yield to form a deposited film ready for volume production, particularly, a functional deposit film (for example, an amorphous semiconductor used for semiconductor devices, electrophotographic photosensitive members, photovoltaic devices, and so on) is formed in an apparatus including a reaction vessel which can be hermetically evacuated, a substrate holder in the reaction vessel, a source gas supply, a power supply for high-frequency power. An end covering member is provided at an end of each of the substrate holder, the source gas supply and the power supply. For enhancing plasma uniformity and long-term stability so as to readily form a film with excellent uniformity of thickness and quality and with good repeatability and for suppressing occurrence of image defects and drastically increasing the yield to form a deposited film ready ...more ...less
20
US2002168859A1
Publication/Patent Number: US2002168859A1
Publication date: 2002-11-14
Application number: 10/059,139
Filing date: 2002-01-31
Abstract: A process for producing an electrophotographic photosensitive member comprising the steps of depositing a non-single crystal material composed basically of silicon atoms, on a cylindrical substrate in a deposition chamber, thereafter once taking the substrate with film out of the deposition chamber, then returning it to the deposition chamber, and thereafter again depositing thereon a non-single-crystal material composed basically of carbon atoms. In another embodiment, the process comprises the steps of depositing on a cylindrical substrate a photoconductive layer formed of a non-single crystal material, subjecting to surface processing the deposited film having protrusions present at its surface, and depositing on the processed surface a surface protective layer formed of a non-single-crystal material. Also disclosed is the electrophotographic photosensitive member thus obtained, and an electrophotographic apparatus having that member. A process for producing an electrophotographic photosensitive member comprising the steps of depositing a non-single crystal material composed basically of silicon atoms, on a cylindrical substrate in a deposition chamber, thereafter once taking the substrate with film out of ...more ...less