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1
JP2004166754A
Publication/Patent Number: JP2004166754A
Publication date: 2004-06-17
Application number: 2002333050
Filing date: 2002-11-18
Abstract: PROBLEM TO BE SOLVED: To provide an upper limb support device adapted to either paralysis of left/right limbs when supporting a unilaterally paralyzed upper limb
2
JP2003245110A
Publication/Patent Number: JP2003245110A
Publication date: 2003-09-02
Application number: 2002050658
Filing date: 2002-02-27
Inventor: Katsuyama, Akiko  
Abstract: PROBLEM TO BE SOLVED: To provide a walking stick aid capable of resolving inefficient actions among a variety of daily actions and allowing a person who has to spend a daily life relying on the walking stick to spend a life with the walking stick conveniently and efficiently. SOLUTION: The aid is provided with a loop of a strap by attaching a strap adjusting tool 3 enabling the person to adjust easily the length of the strap with such a length of enabling to hang on a shoulder of the person and by tying a knot 5 PROBLEM TO BE SOLVED: To provide a walking stick aid capable of resolving inefficient actions among a variety of daily actions and allowing a person who has to spend a daily life relying on the walking stick to spend a life with the walking stick conveniently and efficiently ...more ...less
3
JP2002177688A
Publication/Patent Number: JP2002177688A
Publication date: 2002-06-25
Application number: 2000376959
Filing date: 2000-12-12
Inventor: Katsuyama, Akiko  
Abstract: PROBLEM TO BE SOLVED: To make washing of rubber gloves by means of a washing machine possible and to make drying additionally possible to release from a troublesome and annoying method in which the washing of the rubber gloves is only performed by washing by hand. SOLUTION: Auxiliary tools for washing the rubber gloves prepared by connecting cylindrical tools whose both ends are opened with a string to make a pair of left and right tools are respectively fitted into opening parts of the rubber gloves for the hands and two positions are fixed with double clips in such a way that the auxiliary tools does not come off from the insides of the rubber gloves and they are fed into the washing machine under a condition where they are placed in a commercially available washing net and the washing machine is actuated to wash them. PROBLEM TO BE SOLVED: To make washing of rubber gloves by means of a washing machine possible and to make drying additionally possible to release from a troublesome and annoying method in which the washing of the rubber gloves is only performed by washing by hand. SOLUTION: ...more ...less
4
JP2002272591A
Publication/Patent Number: JP2002272591A
Publication date: 2002-09-24
Application number: 2001074564
Filing date: 2001-03-15
Inventor: Katsuyama, Akiko  
Abstract: PROBLEM TO BE SOLVED: To provide a small article housing tool capable of conveniently and sanitarily housing articles in different sizes such as a toothbrush
5
US20020113035A1
Publication/Patent Number: US20020113035A1
Publication date: 2002-08-22
Application number: 10/011,726
Filing date: 2001-12-11
Abstract: A photosensitive material film is formed by applying, on an etch target film deposited on a semiconductor substrate, a photosensitive material containing a hardly alkaline-soluble base polymer including a polymer in which a principal chain has cycloolefin and a saturated or non-saturated polycyclic alkyl group is bonded to the principal chain, and an acid generator including an onium salt compound. The photosensitive material film is irradiated with ArF excimer laser through a photomask so as to form a hole-patterned photosensitive material film. A hole pattern is formed in said etch target film by subjecting the etch target film to plasma etching using plasma at a plasma density of 1×1010/cm3 or more with the hole-patterned photosensitive material film used as an etching mask. A photosensitive material film is formed by applying, on an etch target film deposited on a semiconductor substrate, a photosensitive material containing a hardly alkaline-soluble base polymer including a polymer in which a principal chain has cycloolefin and a saturated or ...more ...less
6
US6335143B1
Publication/Patent Number: US6335143B1
Publication date: 2002-01-01
Application number: 09/100,973
Filing date: 1998-06-22
Abstract: A resist composition comprising an alkali-soluble polymer, a special cross-linking agent containing one or more oxirane rings and at least one of —O—, —CO—,—COO— and —OCO— groups in the molecule, a photoacid generator, and a solvent can form a film having high transmittance for deep UV light such as ArF excimer laser beams and high etching resistance as well as high resolution, and thus suitable for forming a negative working pattern. A resist composition comprising an alkali-soluble polymer, a special cross-linking agent containing one or more oxirane rings and at least one of —O—, —CO—,—COO— and —OCO— groups in the molecule, a photoacid generator, and a ...more ...less
7
JP2001170185A
Publication/Patent Number: JP2001170185A
Publication date: 2001-06-26
Application number: 36409799
Filing date: 1999-12-22
Inventor: Katsuyama, Akiko  
Abstract: PROBLEM TO BE SOLVED: To neatly
8
JP2001046139A
Publication/Patent Number: JP2001046139A
Publication date: 2001-02-20
Application number: 22255099
Filing date: 1999-08-05
Abstract: PROBLEM TO BE SOLVED: To minimize the feeling of pain in muscles due to the fatigue of abductors of the brachium in manually transporting a portable object by one hand. SOLUTION: A rectangular
9
US20010049075A1
Publication/Patent Number: US20010049075A1
Publication date: 2001-12-06
Application number: 09/520,805
Filing date: 2000-03-08
Abstract: A resist film is formed by applying, on a semiconductor substrate, a resist material including at least one atom or group selected from the group consisting of a halogen atom, a cyano group, a nitro group, an alkoxy group, an amino group, an alkyl group, a trifluoromethyl group and a mercapto group. The resist film is irradiated with exposing light of a wavelength of a 1 nm through 180 nm band for pattern exposure, and the resist film is developed after the pattern exposure, so as to form a resist pattern. A resist film is formed by applying, on a semiconductor substrate, a resist material including at least one atom or group selected from the group consisting of a halogen atom, a cyano group, a nitro group, an alkoxy group, an amino group, an alkyl group, a trifluoromethyl group ...more ...less
10
US6258972B1
Publication/Patent Number: US6258972B1
Publication date: 2001-07-10
Application number: 08/691,124
Filing date: 1996-08-01
Abstract: To the surface of a semiconductor substrate made of silicon, isopropenoxytrimethylsilane is supplied as a surface treating agent to render the surface of the semiconductor substrate hydrophobic and increase adhesion to the semiconductor substrate. Thus, Si(CH3)3 (trimethylsilyl group) is substituted for the hydrogen atom of an OH group on the surface of the semiconductor substrate, resulting in (CH3)2CO (acetone). Subsequently, a chemically amplified resist is applied to the surface of the semiconductor substrate and exposed to light by using a desired mask, followed sequentially by PEB and development for forming a pattern. Since the surface treating agent does not generate ammonia, there can be formed a pattern in excellent configuration with no insoluble skin layer formed thereon. To the surface of a semiconductor substrate made of silicon, isopropenoxytrimethylsilane is supplied as a surface treating agent to render the surface of the semiconductor substrate hydrophobic and increase adhesion to the semiconductor substrate. Thus, Si(CH3)3 (trimethylsilyl ...more ...less
11
JP2000079020A
Publication/Patent Number: JP2000079020A
Publication date: 2000-03-21
Application number: 25313898
Filing date: 1998-09-08
Abstract: PROBLEM TO BE SOLVED: To prevent roughening of hand skin by a detergent and to eliminate the use limit of a brush by providing the detergent at one end of a grip part