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1
US20030049556A1
Publication/Patent Number: US20030049556A1
Publication date: 2003-03-13
Application number: 10/106,440
Filing date: 2002-03-27
Abstract: In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (&mgr;m) and Rs (&OHgr;·cm) which fulfill the following conditions: 1.0×109≦Rs≦1.0×1013Ds≦−0.136Ln(Rs)+(−0.004×PS+6). In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more ...more ...less
2
US20010049066A1
Publication/Patent Number: US20010049066A1
Publication date: 2001-12-06
Application number: 09/871,612
Filing date: 2001-06-04
Abstract: The present invention provides a method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member that enables a uniform and high quality image to be obtained without leaving image defects and irregular images, wherein the cleaning step of the cleaning subject comprises: making the circulation flow rate during dipping of a cleaning subject in the cleaning solution to be different from the circulation flow rate when the cleaning subject is pulled up; and showering the cleaning solution used in the cleaning step during the pull-up step on the surface of the cleaning subject; or wherein the method for manufacturing an electrophotographic photosensitive member for depositing a functional film by a plasma CVD method on an aluminum substrate containing silicon, iron and aluminum especially comprises cleaning steps of: degreasing oil components on the surface of the substrate prior to deposition of a film; making the circulation flow rate during dipping the substrate in the cleaning solvent to be different from the circulation flow rate when the substrate is pulled up; showering the cleaning solution to be used in the degreasing step on the surface of the substrate while the substrate is pulled up; and forming an Al—Si—O coating film using water containing an inhibitor in the rinsing step. The present invention provides a method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member that enables a uniform and high quality image to be obtained without leaving image defects and irregular images ...more ...less