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1
WO2015008341A1
Publication/Patent Number: WO2015008341A1
Publication date: 2015-01-22
Application number: 2013069338
Filing date: 2013-07-17
Inventor: Hidaka, Kishio  
Assignee: Hitachi, Ltd.
Abstract: In the present invention
2
WO2015107647A1
Publication/Patent Number: WO2015107647A1
Publication date: 2015-07-23
Application number: 2014050665
Filing date: 2014-01-16
Assignee: Hitachi, Ltd.
Abstract: Provided is a ferritic steel member which prevents the coarsening of crystal grains in the area thermally affected by the heat input during welding
3
US8695110B2
Publication/Patent Number: US8695110B2
Publication date: 2014-04-08
Application number: 13/586,754
Filing date: 2012-08-15
Assignee: Hitachi, Ltd.
Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample. In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the ...more ...less
4
US8635710B2
Publication/Patent Number: US8635710B2
Publication date: 2014-01-21
Application number: 13/446,279
Filing date: 2012-04-13
Assignee: Hitachi, Ltd.
Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force. Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order ...more ...less
5
WO2013132906A1
Publication/Patent Number: WO2013132906A1
Publication date: 2013-09-12
Application number: 2013051239
Filing date: 2013-01-23
Assignee: Hitachi, Ltd.
Abstract: A liquid sample holder (10) for an electron microscope according to the present invention comprises: a pair of silicon substrates (11) into which a liquid sample (15) is inserted; an electron beam transmitting window (12) that is disposed on the pair of substrates; a frame body (16) having a thickness of equal to or less than 200 nm that is disposed at a position surrounding the window for the injection of the liquid sample; and a sealing resin (17) that is sealed on an outer side of the frame body to allow the frame body to be adhered to the pair of substrates and to seal the liquid sample inside the frame body. A silicon nitride film (13) and a silicon oxide film (14) are formed at a position on the surfaces of the pair of substrates which are in contact with the liquid sample. Therefore A liquid sample holder (10) for an electron microscope according to the present invention comprises: a pair of silicon substrates (11) into which a liquid sample (15) is inserted; an electron beam transmitting window (12) that is disposed on the pair of substrates; a frame body ...more ...less
6
US20130145507A1
Publication/Patent Number: US20130145507A1
Publication date: 2013-06-06
Application number: 13/586,754
Filing date: 2012-08-15
Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample. In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the ...more ...less
7
WO2013190994A1
Publication/Patent Number: WO2013190994A1
Publication date: 2013-12-27
Application number: 2013065528
Filing date: 2013-06-05
Assignee: Hitachi, Ltd.
Abstract: Provided is a sample holder (1) for an electron microscope
8
JP5216509B2
Publication/Patent Number: JP5216509B2
Publication date: 2013-06-19
Application number: 2008252097
Filing date: 2008-09-30
Assignee: HITACHI LTD
Abstract: PROBLEM TO BE SOLVED: To solve the problem of being a limit of resolution in several ten nanometer
9
US8407811B2
Publication/Patent Number: US8407811B2
Publication date: 2013-03-26
Application number: 12/712,745
Filing date: 2010-02-25
Assignee: Hitachi, Ltd.
Abstract: In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this plasmon-enhanced near-field probe is installed in a highly-efficient plasmon exciting unit to repeat approaching to and retracting from each measuring point on a sample with a low contact force, so that optical information and profile information of the surface of the sample are measured with a resolution on the order of nanometers, a high S/N ratio, and high reproducibility without damaging both of the probe and the sample. In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this ...more ...less
10
EP2267428A4
Publication/Patent Number: EP2267428A4
Publication date: 2013-03-27
Application number: 08873098
Filing date: 2008-12-18
Assignee: Hitachi Ltd.
Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force. Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order ...more ...less
11
JP4909813B2
Publication/Patent Number: JP4909813B2
Publication date: 2012-04-04
Application number: 2007147608
Filing date: 2007-06-04
Abstract: PROBLEM TO BE SOLVED: To provide an electron emitting element and an electron gun which has a long service life
12
US8272068B2
Publication/Patent Number: US8272068B2
Publication date: 2012-09-18
Application number: 12/523,369
Filing date: 2008-02-26
Assignee: Hitachi, Ltd.
Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample. In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the ...more ...less
13
US20120204297A1
Publication/Patent Number: US20120204297A1
Publication date: 2012-08-09
Application number: 13/446,279
Filing date: 2012-04-13
Assignee: Hitachi, Ltd.
Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force. Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order ...more ...less