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1
CN104792272B
Publication/Patent Number: CN104792272B
Publication date: 2018-01-30
Application number: 201410217328
Filing date: 2014-05-22
Abstract: Provided is an optical interferometric apparatus for online real-time thickness inspection. The apparatus comprises a light source
2
KR20180027638A
Publication/Patent Number: KR20180027638A
Publication date: 2018-03-14
Application number: 20187006229
Filing date: 2016-08-04
Abstract: (a) 4차 암모늄 하이드록사이드, (b) 수용성 유기 용매의 혼합물, (c) 적어도 하나의 부식 억제제, 및 (d) 물을 함유하는, 3-150 ㎛의 막 두께를 갖는 포토레지스트 패턴을 스트립핑하기 위한 포토레지스트 세정 조성물, 및 이로 기판을 처리하는 방법이 개시된다. (a) 4차 암모늄 하이드록사이드, (b) 수용성 유기 용매의 혼합물, (c) 적어도 하나의 부식 억제제, 및 (d) 물을 함유하는, 3-150 ㎛의 막 두께를 갖는 포토레지스트 패턴을 스트립핑하기 위한 포토레지스트 세정 조성물, 및 이로 기판을 처리하는 방법이 개시된다. ...more ...less
4
US10072237B2
Publication/Patent Number: US10072237B2
Publication date: 2018-09-11
Application number: 15/227,450
Filing date: 2016-08-03
Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 μm, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water, and a method for treating a substrate therewith. It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 μm, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water ...more ...less
5
US9644947B2
Publication/Patent Number: US9644947B2
Publication date: 2017-05-09
Application number: 14/461,548
Filing date: 2014-08-18
Abstract: A device for real-time thickness inspection is provided. An optical interferometric technique is used. Measurement requirements in rapid online thickness inspection can be satisfied. An object is measured in a non-contact and non-destructive way. For measuring, an optical spherical wavefront is radiated on the object in an oblique angle. The interference fringe pattern (IFP) thus imaged on a screen is directly related to the thickness distribution of the object. The phase difference on the same horizontal cross section in the IFP monotonically decreases from the light source side to the other side. Accordingly, phase unwrapping can be effectively performed without using phase shift. The present invention achieves rapid on-line thickness inspection through the optical path of interference without using optical lens groups and special optical elements. The present invention radiates a high-coherence point-expanded spherical-wavefront light beam in an oblique angle for an instantaneous and wide-area full-field thickness measurement. A device for real-time thickness inspection is provided. An optical interferometric technique is used. Measurement requirements in rapid online thickness inspection can be satisfied. An object is measured in a non-contact and non-destructive way. For measuring, an optical ...more ...less
6
TWM536937U
Publication/Patent Number: TWM536937U
Publication date: 2017-02-21
Application number: 105215190
Filing date: 2016-10-06
7
US20170037344A1
Publication/Patent Number: US20170037344A1
Publication date: 2017-02-09
Application number: 15/227,450
Filing date: 2016-08-03
Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 μm, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water, and a method for treating a substrate therewith. It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 μm, which contains (a) quaternary ammonium hydroxide (b) a mixture of water-soluble organic solvents (c) at least one corrosion inhibitor and (d) water ...more ...less
8
WO2017024140A1
Publication/Patent Number: WO2017024140A1
Publication date: 2017-02-09
Application number: 2016045566
Filing date: 2016-08-04
Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 μm
9
TW201712111A
Publication/Patent Number: TW201712111A
Publication date: 2017-04-01
Application number: 105124840
Filing date: 2016-08-04
Abstract: It is disclosed a photoresist cleaning composition for stripping a photoresist pattern having a film thickness of 3-150 [mu]m
10
TWM548560U
Publication/Patent Number: TWM548560U
Publication date: 2017-09-11
Application number: 106205528
Filing date: 2017-04-20
11
US20150204655A1
Publication/Patent Number: US20150204655A1
Publication date: 2015-07-23
Application number: 14/461,548
Filing date: 2014-08-18
Abstract: A device for real-time thickness inspection is provided. An optical interferometric technique is used. Measurement requirements in rapid online thickness inspection can be satisfied. An object is measured in a non-contact and non-destructive way. For measuring, an optical spherical wavefront is radiated on the object in an oblique angle. The interference fringe pattern (IFP) thus imaged on a screen is directly related to the thickness distribution of the object. The phase difference on the same horizontal cross section in the IFP monotonically decreases from the light source side to the other side. Accordingly, phase unwrapping can be effectively performed without using phase shift. The present invention achieves rapid on-line thickness inspection through the optical path of interference without using optical lens groups and special optical elements. The present invention radiates a high-coherence point-expanded spherical-wavefront light beam in an oblique angle for an instantaneous and wide-area full-field thickness measurement. A device for real-time thickness inspection is provided. An optical interferometric technique is used. Measurement requirements in rapid online thickness inspection can be satisfied. An object is measured in a non-contact and non-destructive way. For measuring, an optical ...more ...less
12
TW201530093A
Publication/Patent Number: TW201530093A
Publication date: 2015-08-01
Application number: 103101988
Filing date: 2014-01-20
Abstract: An optical interferometry based on-line real-time thickness measurement apparatus is provided. The apparatus can fulfill the requirement of short time and large area for the on-line and real-time inspection. The thickness of the test object is measured in a non-contact and non-destructive way. To perform the thickness measurement An optical interferometry based on-line real-time thickness measurement apparatus is provided. The apparatus can fulfill the requirement of short time and large area for the on-line and real-time inspection. The thickness of the test object is measured in a non-contact and ...more ...less
13
CN104792272A
Publication/Patent Number: CN104792272A
Publication date: 2015-07-22
Application number: 201410217328
Filing date: 2014-05-22
Abstract: Provided is an optical interferometric apparatus for online real-time thickness inspection. The apparatus comprises a light source
14
TWI486550B
Publication/Patent Number: TWI486550B
Publication date: 2015-06-01
Application number: 103101988
Filing date: 2014-01-20
Abstract: An optical interferometry based on-line real-time thickness measurement apparatus is provided. The apparatus can fulfill the requirement of short time and large area for the on-line and real-time inspection. The thickness of the test object is measured in a non-contact and non-destructive way. To perform the thickness measurement An optical interferometry based on-line real-time thickness measurement apparatus is provided. The apparatus can fulfill the requirement of short time and large area for the on-line and real-time inspection. The thickness of the test object is measured in a non-contact and ...more ...less
15
TWM511333U
Publication/Patent Number: TWM511333U
Publication date: 2015-11-01
Application number: 104210778
Filing date: 2015-07-03
16
TWI485189B
Publication/Patent Number: TWI485189B
Publication date: 2015-05-21
Application number: 101150896
Filing date: 2012-12-28
Abstract: The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amido-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the biodegradable copolymer and the urea. The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amido-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the ...more ...less
17
US9084822B2
Publication/Patent Number: US9084822B2
Publication date: 2015-07-21
Application number: 13/871,491
Filing date: 2013-04-26
Abstract: The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amide-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the biodegradable copolymer and the urea. The method for preparing the above solid form includes: dissolving a biodegradable copolymer and an amide-containing compound in water at a first temperature, obtaining a solution; cooling the solution at a second temperature to form a solid mixture; and the solid mixture is subjected to a freeze-drying process at a third temperature. The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amide-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the ...more ...less
18
US20140187591A1
Publication/Patent Number: US20140187591A1
Publication date: 2014-07-03
Application number: 13/871,491
Filing date: 2013-04-26
Abstract: The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amide-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the biodegradable copolymer and the urea. The method for preparing the above solid form includes: dissolving a biodegradable copolymer and an amide-containing compound in water at a first temperature, obtaining a solution; cooling the solution at a second temperature to form a solid mixture; and the solid mixture is subjected to a freeze-drying process at a third temperature. The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amide-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the ...more ...less
19
TW201425400A
Publication/Patent Number: TW201425400A
Publication date: 2014-07-01
Application number: 101150896
Filing date: 2012-12-28
Abstract: The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amido-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the biodegradable copolymer and the urea. The disclosure provides a solid form and a method for preparing the same. The solid form consists essentially of a biodegradable copolymer and an amido-containing compound. The biodegradable copolymer is semi-crystalline due to the dipole-dipole interaction between the ...more ...less
20
TWI386371B
Publication/Patent Number: TWI386371B
Publication date: 2013-02-21
Application number: 98129341
Filing date: 2009-08-31
Abstract: The invention provides a method for recycling indium tin oxide sputtering liquid waste. The method is characterized in that while adjusting pH value of indium containing liquid waste with sodium hydroxide to 5