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1
EP0825493B1
Publication/Patent Number: EP0825493B1
Publication date: 2008-07-30
Application number: 97114489.4
Filing date: 1997-08-21
Abstract: For maintaining good cleanability even in use of low-melting-point or small-particle-diameter toner, thereby achieving a breakthrough improvement in the quality of image, the following conditions are satisfied: (x: height of unevenness, y: pitch of unevenness, a: particle diameter of toner). For maintaining good cleanability even in use of low-melting-point or small-particle-diameter toner, thereby achieving a breakthrough improvement in the quality of image, the following conditions are satisfied: (x: height of unevenness, y: pitch of unevenness, a: particle ...more ...less
2
DE69738858D1
Publication/Patent Number: DE69738858D1
Publication date: 2008-09-11
Application number: 69738858
Filing date: 1997-08-21
Assignee: CANON K.K.
3
US6686109B2
Publication/Patent Number: US6686109B2
Publication date: 2004-02-03
Application number: 10/106,440
Filing date: 2002-03-27
Abstract: In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (&mgr;m) and Rs (&OHgr;·cm) which fulfill the following conditions: 1.0×109≦Rs≦1.0×1013 Ds≦−0.136Ln(Rs)+(−0.004×PS+6). In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more ...more ...less
4
US20030049556A1
Publication/Patent Number: US20030049556A1
Publication date: 2003-03-13
Application number: 10/106,440
Filing date: 2002-03-27
Abstract: In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (&mgr;m) and Rs (&OHgr;·cm) which fulfill the following conditions: 1.0×109≦Rs≦1.0×1013Ds≦−0.136Ln(Rs)+(−0.004×PS+6). In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more ...more ...less
5
US6557569B2
Publication/Patent Number: US6557569B2
Publication date: 2003-05-06
Application number: 09/871,612
Filing date: 2001-06-04
Abstract: A method of manufacturing an electrophotographic photosensitive member includes the steps of: cleaning a substrate of the electrophotographic photosensitive member by cleaning step using a vessel and machining the substrate. The cleaning step includes a first overflowing step and a second overflowing step. In the first overflowing step, the liquid is allowed to be overflowed from a vessel while the substrate of the electrophotographic photosensitive member is immersed in the liquid contained in the vessel. In the second overflowing step, the liquid is allowed to overflow from a vessel while the substrate of the electrophotographic photosensitive member is pulled up in the liquid contained in the vessel. A flow rate Q2 of the overflowing liquid of the second overflowing step is higher than a flow rate Q1 of the overflowing liquid of the first overflowing step. The machining step forms a film of a photosensitive substance on the substrate. A method of manufacturing an electrophotographic photosensitive member includes the steps of: cleaning a substrate of the electrophotographic photosensitive member by cleaning step using a vessel and machining the substrate. The cleaning step includes a first overflowing step ...more ...less
6
US6391394B1
Publication/Patent Number: US6391394B1
Publication date: 2002-05-21
Application number: 08/999,456
Filing date: 1997-12-29
Abstract: A method for manufacturing an electrophotographic photosensitive member in which an aluminum substrate is fitted on a substrate holder and a functional film comprising a non-monocrystalline material containing silicon atoms as the matrix is formed by low pressure chemical deposition on the surface of the substrate, which comprises surface of the substrate is cleaned with water in which carbon dioxide is dissolved, the substrate holder comprises a metal as the matrix and has formed ceramics at least on the inner surface. This method and a jig used therein make it possible to prevent fine image defects, thereby improving electrophotography characteristics, and to economically and stably manufacture electrophotographic photosensitive members which provide high quality images free from defects and unevenness. A method for manufacturing an electrophotographic photosensitive member in which an aluminum substrate is fitted on a substrate holder and a functional film comprising a non-monocrystalline material containing silicon atoms as the matrix is formed by low pressure chemical ...more ...less
7
US6406554B1
Publication/Patent Number: US6406554B1
Publication date: 2002-06-18
Application number: 09/605,759
Filing date: 2000-06-28
Abstract: The present invention provides a method of producing an electrophotographic photosensitive member capable of obtaining high-quality uniform images without image defects and nonuniformity in image density. The method of producing an electrophotographic photosensitive member includes a step forming a functional film on a substrate, and a washing step of spraying water on the substrate surface from concentrically arranged nozzle groups positioned in a twisted relationship before the step of forming the functional film. The present invention provides a method of producing an electrophotographic photosensitive member capable of obtaining high-quality uniform images without image defects and nonuniformity in image density. The method of producing an electrophotographic photosensitive member ...more ...less
8
US6335281B1
Publication/Patent Number: US6335281B1
Publication date: 2002-01-01
Application number: 09/334,176
Filing date: 1999-06-16
Abstract: In a deposited film forming process or apparatus, a deposited film is formed on a film-forming substrate by reduced-pressure vapor phase growth. The film-forming substrate is set on an auxiliary substrate and an auxiliary-substrate cap member is set at the upper part thereof. A maximum temperature difference between temperature at the upper end of the film-forming substrate and the temperature at the lower end of the auxiliary-substrate cap member provided on the film-forming substrate at its upper part is so controlled as to be not greater than a prescribed value so that a film deposited on the auxiliary-substrate cap member is improved in adhesion. Any deposits of films on the part other than the film-forming substrate can be prevented from coming off and scattering on the film-forming substrate so that deposited films having uniform film thickness and film quality can steadily be formed and also faulty images can occur less frequently. It is also possible to achieve improvements of various properties of films formed, film forming rate, reproducibility, and productivity so that yield can dramatically be improved in mass production. In a deposited film forming process or apparatus, a deposited film is formed on a film-forming substrate by reduced-pressure vapor phase growth. The film-forming substrate is set on an auxiliary substrate and an auxiliary-substrate cap member is set at the upper part thereof. A ...more ...less
9
EP1246026A1
Publication/Patent Number: EP1246026A1
Publication date: 2002-10-02
Application number: 02007023.1
Filing date: 2002-03-27
Abstract: In an electrophotographic process using an amorphous silicon photosensitive member (100) which has a surface protective layer (104) and effecting reverse development and cleaning with a cleaning blade (410), the surface moving speed PS (mm/sec) of the photosensitive member (100) is 320mm/sec or more and a film thickness and a specific resistance value of the surface protective layer (104) are respectively Ds (µm) and Rs (Ω·cm) which fulfill the following conditions:1.0 × 109 ≤ Rs ≤ 1.0 × 1013Ds ≤ - 0.136Ln(Rs) + (-0.004 × PS + 6). In an electrophotographic process using an amorphous silicon photosensitive member (100) which has a surface protective layer (104) and effecting reverse development and cleaning with a cleaning blade (410), the surface moving speed PS (mm/sec) of the photosensitive member (100) ...more ...less
10
US6435130B1
Publication/Patent Number: US6435130B1
Publication date: 2002-08-20
Application number: 08/916,540
Filing date: 1997-08-22
Abstract: A plasma CVD apparatus comprising a substantially enclosed reaction chamber containing substrate holding means and a cathode electrode arranged therein, wherein a high frequency power from a high frequency power source is supplied to said cathode electrode to generate plasma between said substrate holding means having a subtrate positioned thereon and said cathode electrode whereby plasma-processing said substrate, characterized in that said cathode electrode comprises a plurality of conductor members situated on substantially the same axis which are capacitively coupled by a dielectric member. A plasma-processing method using said cathode electrode. A plasma CVD apparatus comprising a substantially enclosed reaction chamber containing substrate holding means and a cathode electrode arranged therein, wherein a high frequency power from a high frequency power source is supplied to said cathode electrode to generate plasma ...more ...less
11
US20010049066A1
Publication/Patent Number: US20010049066A1
Publication date: 2001-12-06
Application number: 09/871,612
Filing date: 2001-06-04
Abstract: The present invention provides a method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member that enables a uniform and high quality image to be obtained without leaving image defects and irregular images, wherein the cleaning step of the cleaning subject comprises: making the circulation flow rate during dipping of a cleaning subject in the cleaning solution to be different from the circulation flow rate when the cleaning subject is pulled up; and showering the cleaning solution used in the cleaning step during the pull-up step on the surface of the cleaning subject; or wherein the method for manufacturing an electrophotographic photosensitive member for depositing a functional film by a plasma CVD method on an aluminum substrate containing silicon, iron and aluminum especially comprises cleaning steps of: degreasing oil components on the surface of the substrate prior to deposition of a film; making the circulation flow rate during dipping the substrate in the cleaning solvent to be different from the circulation flow rate when the substrate is pulled up; showering the cleaning solution to be used in the degreasing step on the surface of the substrate while the substrate is pulled up; and forming an Al—Si—O coating film using water containing an inhibitor in the rinsing step. The present invention provides a method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member that enables a uniform and high quality image to be obtained without leaving image defects and irregular images ...more ...less
12
US6318382B1
Publication/Patent Number: US6318382B1
Publication date: 2001-11-20
Application number: 09/467,181
Filing date: 1999-12-20
Abstract: A method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member enables a uniform and high quality image to be obtained without leaving image defects and irregular images. The method includes a cleaning step during which the circulation flow rate during dipping of the cleaning subject in a cleaning solution is different from the circulation flow rate when the cleaning subject is pulled up, and where the cleaning solution is showered on the surface of the cleaning subject when it is pulled up. The cleaning method may be used in a method for manufacturing an electrophotographic photosensitive member for depositing a functional film by a plasma CVD method on a substrate. A method for efficiently cleaning a cleaning subject, especially a method for cleaning an electrophotographic photosensitive member enables a uniform and high quality image to be obtained without leaving image defects and irregular images. The method includes a cleaning step ...more ...less
13
US6158382A
Publication/Patent Number: US6158382A
Publication date: 2000-12-12
Application number: 98/923,397
Filing date: 1997-12-12
Abstract: A film-forming method by a plasma CVD process
14
US6103442A
Publication/Patent Number: US6103442A
Publication date: 2000-08-15
Application number: 21/863,398
Filing date: 1998-12-22
Abstract: The present invention provides a method of producing an electrophotographic photosensitive member capable of obtaining high-quality uniform images without image defects and nonuniformity in image density. The method of producing an electrophotographic photosensitive member includes a step forming a functional film on a substrate The present invention provides a method of producing an electrophotographic photosensitive member capable of obtaining high-quality uniform images without image defects and nonuniformity in image density. The method of producing an electrophotographic photosensitive member ...more ...less
15
US6156472A
Publication/Patent Number: US6156472A
Publication date: 2000-12-05
Application number: 18/642,198
Filing date: 1998-11-05
Abstract: To provide an electrophotographic photosensitive member manufacturing method capable of preventing a substrate from corroding in working of the substrate and obtaining a high-quality image free from image defects and image density unevenness
16
US6122467A
Publication/Patent Number: US6122467A
Publication date: 2000-09-19
Application number: 31/098,699
Filing date: 1999-05-13
Abstract: In order to reduce the cost of a photosensitive member and to prevent the fluctuation in image density and the image smear by highly precise temperature control
17
US6110629A
Publication/Patent Number: US6110629A
Publication date: 2000-08-29
Application number: 31/098,799
Filing date: 1999-05-13
Abstract: A cylindrical
18
US6055404A
Publication/Patent Number: US6055404A
Publication date: 2000-04-25
Application number: 30/976,599
Filing date: 1999-05-11
Abstract: In order to prevent uneven shaving of a light receiving member and fusion of a developer
19
US5943531A
Publication/Patent Number: US5943531A
Publication date: 1999-08-24
Application number: 91/600,797
Filing date: 1997-08-21
Abstract: For maintaining good cleanability even in use of low-melting-point or small-particle-diameter toner
20
US5983043A
Publication/Patent Number: US5983043A
Publication date: 1999-11-09
Application number: 21/862,898
Filing date: 1998-12-22
Abstract: In a surface potential measuring apparatus for measuring a potential configuration by moving a photosensitive body of an image forming apparatus of electrophotographic type and at least one potential sensor relative to each other and by generating dielectric current in the potential sensor due to change in potential on a surface of the photosensitive body and by analyzing the dielectric current In a surface potential measuring apparatus for measuring a potential configuration by moving a photosensitive body of an image forming apparatus of electrophotographic type and at least one potential sensor relative to each other and by generating dielectric current in the ...more ...less