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1
US10256074B2
Publication/Patent Number: US10256074B2
Publication date: 2019-04-09
Application number: 15/671,112
Filing date: 2017-08-07
Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample. To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam ...more ...less
2
EP3473358A1
Publication/Patent Number: EP3473358A1
Publication date: 2019-04-24
Application number: 18192171.9
Filing date: 2018-09-03
Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an electron detector 72 that is configured to detect electrons that may be emitted in a predetermined direction from the front surface of the powder layer 32 when the powder layer 32 is irradiated with the electron beam EB, a melting judging unit 410 that is configured to generate a melting signal based on the strength of the detection signal from the electron detector 72, and a deflection controller 420 that is configured to receive the melting signal to determine the condition of the irradiation the electron beam. Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an electron detector 72 that is configured to detect ...more ...less
3
US2019118286A1
Publication/Patent Number: US2019118286A1
Publication date: 2019-04-25
Application number: 16/121,581
Filing date: 2018-09-04
Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an electron detector 72 that is configured to detect electrons that may be emitted in a predetermined direction from the front surface of the powder layer 32 when the powder layer 32 is irradiated with the electron beam EB, a melting judging unit 410 that is configured to generate a melting signal based on the strength of the detection signal from the electron detector 72, and a deflection controller 420 that is configured to receive the melting signal to determine the condition of the irradiation the electron beam. Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an electron detector 72 that is configured to detect ...more ...less
4
US2019118287A1
Publication/Patent Number: US2019118287A1
Publication date: 2019-04-25
Application number: 16/127,225
Filing date: 2018-09-11
Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an insulating portion that electrically insulates a three-dimensional structure 36 from a ground potential member, an ammeter 73 that is configured to measure the current value indicative of the current flowing into the ground after passing through the three-dimensional structure 36, a melting judging unit 410 that is configured to detect that the powder layer 32 is melted based on the current value measured by the ammeter 73 and generate a melting signal, and a deflection controller 420 that is configured to receive the melting signal to determine the condition for the irradiation with the electron beam. Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an insulating portion that electrically insulates a ...more ...less
5
EP3473359A1
Publication/Patent Number: EP3473359A1
Publication date: 2019-04-24
Application number: 18192172.7
Filing date: 2018-09-03
Abstract: Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an insulating portion that electrically insulates a three-dimensional structure 36 from a ground potential member, an ammeter 73 that is configured to measure the current value indicative of the current flowing into the ground after passing through the three-dimensional structure 36, a melting judging unit 410 that is configured to detect that the powder layer 32 is melted based on the current value measured by the ammeter 73 and generate a melting signal, and a deflection controller 420 that is configured to receive the melting signal to determine the condition for the irradiation with the electron beam. Provided is a three-dimensional laminating and shaping apparatus 100 including a column unit 200 that is configured to output an electron beam EB and deflect the electron beam EB toward the front surface of a powder layer 32, an insulating portion that electrically insulates a ...more ...less
6
US201867402A1
Publication/Patent Number: US201867402A1
Publication date: 2018-03-08
Application number: 20/171,578
Filing date: 2017-10-18
Abstract: An exposure apparatus including a plurality of column units to generate a plurality of charged particle beams arrayed in a first direction, a column control unit to separately control irradiation timings of the charged particle beams, a converting unit to convert design data describing an arrangement coordinate of device patterns as a base into exposure data including second data which is divided into belt-like regions having a width of one charged particle beam and extending in a second direction, and first data which specifies the second data based on a position of the first direction, a first storing unit to store the exposure data, and a distributing unit to distribute each of the column units by reconfiguring the exposure data in accordance with an exposure order, and a method of creating exposure data structure and beam control data for such an exposure apparatus are provided. An exposure apparatus including a plurality of column units to generate a plurality of charged particle beams arrayed in a first direction, a column control unit to separately control irradiation timings of the charged particle beams, a converting unit to convert design data ...more ...less
7
WO2018131109A1
Publication/Patent Number: WO2018131109A1
Publication date: 2018-07-19
Application number: 2017000770
Filing date: 2017-01-12
Abstract: [Problem] To provide a three-dimensional printing device wherein a plurality of electron beams having different beam shapes simultaneously irradiate approximately the same range of the surface of a powder layer. [Solution] The electron beam column 200 of this three-dimensional printing device 100 is equipped with: a plurality of electron sources 20, each containing an electron source having an anisotropic beam generating unit; and beam shape transforming elements 30, each for transforming the beam shape, at a surface 63 of a powder layer 62, of an electron beam emitted from each of the electron sources 20. The electron beam column 200 is equipped with a deflector 50 with which electron beams emitted from each of the plurality of electron sources 20 are deflected by a distance larger than the beam spacing between the electron beams before passage through the deflector 50. In this manner, the three-dimensional printing device 100 equipped with the electron beam column 200 simultaneously irradiates approximately the same range of the surface 63 of the powder layer 62 with the plurality of electron beams having different beam shapes while forming a three dimensional structure 66 by the powder layer 62 being melted and solidifying. [Problem] To provide a three-dimensional printing device wherein a plurality of electron beams having different beam shapes simultaneously irradiate approximately the same range of the surface of a powder layer. [Solution] The electron beam column 200 of this three-dimensional ...more ...less
8
TW201810351A
Publication/Patent Number: TW201810351A
Publication date: 2018-03-16
Application number: 106123688
Filing date: 2015-10-12
Abstract: A complex and fine pattern is formed by combination of a light exposure technique and a charged particle beam exposure technique. In an exposure apparatus for irradiating the charged particle beams at a position corresponding to a line pattern on a sample, provided is an exposure apparatus and an exposure method, wherein the exposure apparatus comprises: a beam generating unit for generating a plurality of charged particle beams having different irradiation positions in the width direction of the line pattern; an injection control unit for injecting irradiation positions of the charged particle beams along the longitudinal direction of the line pattern; a selection unit for selecting at least one charged particle beam to be irradiated on the sample among the charged particle beams at a designated irradiation position in the longitudinal direction on the line pattern; and an irradiation control unit for controlling irradiation of the sample with at least one selected charged particle beam. A complex and fine pattern is formed by combination of a light exposure technique and a charged particle beam exposure technique. In an exposure apparatus for irradiating the charged particle beams at a position corresponding to a line pattern on a sample, provided is an ...more ...less
9
US9684245B2
Publication/Patent Number: US9684245B2
Publication date: 2017-06-20
Application number: 14/738,934
Filing date: 2015-06-15
Abstract: An exposure apparatus is configured to include an electronic optical system 108 that generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detector 44 and a fog preventing mechanism 70 that are placed between the electronic optical system 108 and the wafer stage WS. A substrate 71 constitutes the fog preventing mechanism 70, and opening holes 71a0 that penetrate up to the upper surface of the substrate 71 are formed in a first area of the bottom surface of the substrate 71, and opening holes 71a0 that are closed in the substrate 71 are formed in a second area of the bottom surface. An exposure apparatus is configured to include an electronic optical system 108 that generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detector 44 and a fog preventing mechanism 70 that are placed ...more ...less
10
KR101772545B1
Publication/Patent Number: KR101772545B1
Publication date: 2017-08-29
Application number: 20150144061
Filing date: 2015-10-15
Abstract: The present invention relates to an exposure apparatus and an exposure method. The exposure apparatus forms a complex and fine pattern by combining a light exposure technique and a charged particle beam exposure technique. The exposure apparatus
11
TWI600047B
Publication/Patent Number: TWI600047B
Publication date: 2017-09-21
Application number: 104133390
Filing date: 2015-10-12
Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology
12
KR20170100464A
Publication/Patent Number: KR20170100464A
Publication date: 2017-09-04
Application number: 20170106028
Filing date: 2017-08-22
Abstract: A complex and fine pattern is formed by combination of a light exposure technique and a charged particle beam exposure technique. In an exposure apparatus for irradiating the charged particle beams at a position corresponding to a line pattern on a sample
13
US2017358426A1
Publication/Patent Number: US2017358426A1
Publication date: 2017-12-14
Application number: 15/671,112
Filing date: 2017-08-07
Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample. To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam ...more ...less
14
EP3089194A3
Publication/Patent Number: EP3089194A3
Publication date: 2017-02-15
Application number: 16166085.7
Filing date: 2016-04-19
Abstract: A device that deforms and deflects a beam, including an aperture layer that includes a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section that includes a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section that includes an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode that faces the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode. A device that deforms and deflects a beam, including an aperture layer that includes a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the ...more ...less
15
TW201711088A
Publication/Patent Number: TW201711088A
Publication date: 2017-03-16
Application number: 105111649
Filing date: 2016-04-14
Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography
16
US9734988B2
Publication/Patent Number: US9734988B2
Publication date: 2017-08-15
Application number: 14/883,634
Filing date: 2015-10-15
Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample. To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam ...more ...less
17
US2016062249A1
Publication/Patent Number: US2016062249A1
Publication date: 2016-03-03
Application number: 14/738,934
Filing date: 2015-06-15
Abstract: An exposure apparatus is configured to include an electronic optical system 108 that generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detector 44 and a fog preventing mechanism 70 that are placed between the electronic optical system 108 and the wafer stage WS. A substrate 71 constitutes the fog preventing mechanism 70, and opening holes 71a0 that penetrate up to the upper surface of the substrate 71 are formed in a first area of the bottom surface of the substrate 71, and opening holes 71a0 that are closed in the substrate 71 are formed in a second area of the bottom surface. An exposure apparatus is configured to include an electronic optical system 108 that generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detector 44 and a fog preventing mechanism 70 that are placed ...more ...less
18
DE102015109529A1
Publication/Patent Number: DE102015109529A1
Publication date: 2016-03-03
Application number: 102015109529
Filing date: 2015-06-15
Abstract: Durch die vorliegende Erfindung wird eine Belichtungsvorrichtung bereitgestellt
19
KR20160078224A
Publication/Patent Number: KR20160078224A
Publication date: 2016-07-04
Application number: 20150144061
Filing date: 2015-10-15
Abstract: The present invention relates to an exposure apparatus and an exposure method. The exposure apparatus forms a complex and fine pattern by combining a light exposure technique and a charged particle beam exposure technique. The exposure apparatus
20
EP3038130A3
Publication/Patent Number: EP3038130A3
Publication date: 2016-10-19
Application number: 15189949.9
Filing date: 2015-10-15
Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section (20, 30, 40, 50) that generates a plurality of the charged particle beams at different irradiation positions in a width direction (Y) of the line pattern; a scanning control section (190) that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction (X) of the line pattern; a selecting section (160) that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section (170) that controls the at least one selected charged particle beam to irradiate the sample. To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam ...more ...less