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1
US10252871B2
Publication/Patent Number: US10252871B2
Publication date: 2019-04-09
Application number: 15/211,080
Filing date: 2016-07-15
Assignee: Avision Inc.
Abstract: The present disclosure provides a transmission assembly and an office machine comprising the same. The transmission assembly includes a body, a first roller, a second roller, a flexible element, a third roller and a transmission element. The first roller is pivoted at a first position of the body, the second roller is pivoted at a second position of the body, one end of the flexible element connects to the body, the third roller is pivoted besides the first roller in parallel and rotates with the first roller simultaneously, and a transmission element is used to surround axes of the first roller and the second roller; wherein, the rotating directions of the first roller, the second roller, the third roller and the transmission element are the same. The present disclosure provides another office machine using the same. The present disclosure provides a transmission assembly and an office machine comprising the same. The transmission assembly includes a body, a first roller, a second roller, a flexible element, a third roller and a transmission element. The first roller is pivoted at a first ...more ...less
2
US10222002B2
Publication/Patent Number: US10222002B2
Publication date: 2019-03-05
Application number: 15/605,535
Filing date: 2017-05-25
Abstract: This disclosure discloses a light-emitting bulb. The light-emitting bulb includes a cover, an electrical associated with the cover, a board arranged between the cover and the electrical connector, and a first light-emitting device disposed on the board. The first light-emitting device includes a carrier having a first side and a second side, a first electrode part disposed near the first side and extending to the second side, a bended part disposed near to the second side and spaced apart from the first electrode part, and a second electrode part extending from the bended part to the first side. No light-emitting diode unit is arranged on the second electrode part. This disclosure discloses a light-emitting bulb. The light-emitting bulb includes a cover, an electrical associated with the cover, a board arranged between the cover and the electrical connector, and a first light-emitting device disposed on the board. The first light-emitting ...more ...less
3
US20190154209A1
Publication/Patent Number: US20190154209A1
Publication date: 2019-05-23
Application number: 16/258,281
Filing date: 2019-01-25
Abstract: This disclosure discloses a light-emitting bulb. The light-emitting bulb includes a cover, an electrical associated with the cover, a board arranged between the cover and the electrical connector, and a first light-emitting device disposed on the board. The first light-emitting device includes a carrier having a first side and a second side, a first electrode part disposed near the first side and extending to the second side, a bended part disposed near to the second side and spaced apart from the first electrode part, and a second electrode part extending from the bended part to the first side. No light-emitting diode unit is arranged on the second electrode part. This disclosure discloses a light-emitting bulb. The light-emitting bulb includes a cover, an electrical associated with the cover, a board arranged between the cover and the electrical connector, and a first light-emitting device disposed on the board. The first light-emitting ...more ...less
4
US9952034B2
Publication/Patent Number: US9952034B2
Publication date: 2018-04-24
Application number: 15/609,862
Filing date: 2017-05-31
Abstract: An optical interferometric system for measurement of a full-field thickness of a plate-like object in real time includes two light sources, two screens, two image capturing devices, and an image processing module. The light sources radiate incident lights toward a reference point on the plate-like object in respective directions to produce respective interference fringe patterns (IFPs). The image capturing devices capture light intensity distribution images respectively of the IFPS imaged respectively on the screens. The image processing module calculates a fringe order at the reference point according to the light intensity distribution images, and obtains a full-field thickness distribution of the plate-like object according to the fringe order. An optical interferometric system for measurement of a full-field thickness of a plate-like object in real time includes two light sources, two screens, two image capturing devices, and an image processing module. The light sources radiate incident lights toward a reference ...more ...less
5
CN107543502A
Publication/Patent Number: CN107543502A
Publication date: 2018-01-05
Application number: 201610569125
Filing date: 2016-07-19
Abstract: 种即时检测全场厚度的光学装置,包含两个光源单元、两个屏幕、两个影像撷取器及影像处理模块。两个光源单元分别产生行进至平面待测件的参考点的第入射光与第二入射光,该第入射光与该第二入射光为点扩束且具有相干性的球面光波,并分别产生第干涉条纹与第二干涉条纹。两个屏幕分别将第干涉条纹与第二干涉条纹成像于其上。两个影像撷取器分别设置于两个屏幕之上,撷取干涉条纹的光强影像。影像处理模块与影像撷取器连接以获得数字信号,并计算平面待测件的全场厚度分布。本发明可直接求得平面待测件的全场厚度分布,而无需经过相位移或先以其它设备测量平面待测件的任点的绝对厚度,从而节省了检测上所需的时间与相关设备的成本。 种即时检测全场厚度的光学装置,包含两个光源单元、两个屏幕、两个影像撷取器及影像处理模块。两个光源单元分别产生行进至平面待测件的参考点的第入射光与第二入射光,该第入射光与该第二入射光为点扩束且具有相干性的球面光波,并分别产生第干涉条纹与第二干涉条纹。两个屏幕分别将第干涉条纹与第二干涉条纹成像于其上。两个影像撷取器分别设置于两个屏幕之上,撷取干涉条纹的光强影像。影像处理模块与影像撷取器连接以获得数字信号,并计算平面待测件的全场厚度分布。本发明可直接求得平面待测件的全场厚度分布,而无需经过相位移或先以其它设备测量平面待测件的任点的绝对厚度,从而节省了检测上所需 ...more ...less
6
TWI619933B
Publication/Patent Number: TWI619933B
Publication date: 2018-04-01
Application number: 105140876
Filing date: 2016-12-09
7
US20180164169A1
Publication/Patent Number: US20180164169A1
Publication date: 2018-06-14
Application number: 15/618,145
Filing date: 2017-06-09
Abstract: A stress measurement method is provided of the present disclosure. The stress measurement method includes an image capturing procedure, a phase shift calculation procedure, an isochromatic intensifying procedure and a transformation procedure. The image capturing procedure is used to capture four light intensity images with four different phase angles of a sample. The phase shift calculation procedure is used to obtain an isochromatic retardation of the sample when the four light intensity images have sufficient light intensity values. The isochromatic intensifying procedure is used to calculate two enhanced light intensity values, the background of intensified isochromatic light intensity value and the amplitude of intensified isochromatic light intensity value to obtain an isochromatic retardation when the sample is in a low stress condition. The transformation procedure is used to transform the isochromatic retardation to a stress value of the sample. A stress measurement method is provided of the present disclosure. The stress measurement method includes an image capturing procedure, a phase shift calculation procedure, an isochromatic intensifying procedure and a transformation procedure. The image capturing procedure is ...more ...less
8
US10067012B2
Publication/Patent Number: US10067012B2
Publication date: 2018-09-04
Application number: 15/618,145
Filing date: 2017-06-09
Abstract: A stress measurement method is provided of the present disclosure. The stress measurement method includes an image capturing procedure, a phase shift calculation procedure, an isochromatic intensifying procedure and a transformation procedure. The image capturing procedure is used to capture four light intensity images with four different phase angles of a sample. The phase shift calculation procedure is used to obtain an isochromatic retardation of the sample when the four light intensity images have sufficient light intensity values. The isochromatic intensifying procedure is used to calculate two enhanced light intensity values, the background of intensified isochromatic light intensity value and the amplitude of intensified isochromatic light intensity value to obtain an isochromatic retardation when the sample is in a low stress condition. The transformation procedure is used to transform the isochromatic retardation to a stress value of the sample. A stress measurement method is provided of the present disclosure. The stress measurement method includes an image capturing procedure, a phase shift calculation procedure, an isochromatic intensifying procedure and a transformation procedure. The image capturing procedure is ...more ...less
9
CN104792272B
Publication/Patent Number: CN104792272B
Publication date: 2018-01-30
Application number: 201410217328
Filing date: 2014-05-22
Abstract: Provided is an optical interferometric apparatus for online real-time thickness inspection. The apparatus comprises a light source
10
US20180024016A1
Publication/Patent Number: US20180024016A1
Publication date: 2018-01-25
Application number: 15/653,855
Filing date: 2017-07-19
Abstract: A method for analyzing stress in an object according to spectrum data is provided. The spectrum data is obtained from an interference fringe pattern of the object that results from performing photoelasticity. The method includes: analyzing the spectrum data to obtain three sets of intensity data related respectively to different wavelengths of light used in photoelasticity; calculating wrapped phases according to the three sets of intensity data, respectively; calculating preliminary stress values according to the wrapped phases, respectively; determining a system of stress equations according to a relation among the preliminary stress values; and calculating an estimated stress value using the system of stress equations. A method for analyzing stress in an object according to spectrum data is provided. The spectrum data is obtained from an interference fringe pattern of the object that results from performing photoelasticity. The method includes: analyzing the spectrum data to obtain three sets ...more ...less
11
TW201804140A
Publication/Patent Number: TW201804140A
Publication date: 2018-02-01
Application number: 105123152
Filing date: 2016-07-22
Abstract: A stress analysis method based on temporal phase unwrapping is to be implemented by a computer device, and includes: (A) receiving spectrum data which is generated from an interference pattern of an object by an optical inspection system through photoeleastic technique, and has at least three light intensity information with respect to different wavelengths; (B) calculating a wrapped phase information based on each of the light intensity information; (C) calculating a wrapped stress information, which is proportional to a product result of each of the wrapped phase information and a linear function of each of the wavelengths, based on each of the wrapped phase information; (D) selecting a calculation relation based on the relation between the wrapped stress information; and (E) calculating a stress value with respect to the wrapped stress information through the calculation relation. A stress analysis method based on temporal phase unwrapping is to be implemented by a computer device, and includes: (A) receiving spectrum data which is generated from an interference pattern of an object by an optical inspection system through photoeleastic technique, and has ...more ...less
12
US10036677B2
Publication/Patent Number: US10036677B2
Publication date: 2018-07-31
Application number: 15/653,855
Filing date: 2017-07-19
Abstract: A method for analyzing stress in an object according to spectrum data is provided. The spectrum data is obtained from an interference fringe pattern of the object that results from performing photoelasticity. The method includes: analyzing the spectrum data to obtain three sets of intensity data related respectively to different wavelengths of light used in photoelasticity; calculating wrapped phases according to the three sets of intensity data, respectively; calculating preliminary stress values according to the wrapped phases, respectively; determining a system of stress equations according to a relation among the preliminary stress values; and calculating an estimated stress value using the system of stress equations. A method for analyzing stress in an object according to spectrum data is provided. The spectrum data is obtained from an interference fringe pattern of the object that results from performing photoelasticity. The method includes: analyzing the spectrum data to obtain three sets ...more ...less