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1
US10199251B2
Publication/Patent Number: US10199251B2
Publication date: 2019-02-05
Application number: 15/949,205
Filing date: 2018-04-10
Abstract: A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The optical element projects the measurement light, as projection light, generated by the light source and receives reflected light. The reflective member is disposed on the transport device. The reflective member reflects the projection light toward the placement table, and reflects the reflected light of the projection light, which is projected toward the placement table, toward the optical element. The drive unit operates the transport device so that the reflective member scans a plurality of linear scanning ranges. The controller calculates positional relationship between the focus ring and the object placed on the placement table based on the reflected light within the plurality of linear scanning ranges. A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The ...more ...less
2
US10197389B2
Publication/Patent Number: US10197389B2
Publication date: 2019-02-05
Application number: 15/305,166
Filing date: 2016-08-18
Abstract: Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions. Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a ...more ...less
3
US10197390B2
Publication/Patent Number: US10197390B2
Publication date: 2019-02-05
Application number: 15/540,909
Filing date: 2015-12-30
Abstract: A pre-alignment measurement device includes, disposed in a direction of propagation of light, a laser, a first cylindrical lens, a first imaging lens, an illumination diaphragm, a second imaging lens, a second cylindrical lens and a CCD detector. The laser, an object under measurement and the CCD detector are arranged at respective apexes of a triangle formed by the measurement device for pre-alignment. A light beam is emanated by the laser and is transformed into a line beam. The line beam is reflected by the object under measurement and then passes through the second cylindrical lens to form a CCD image which has different horizontal and vertical magnifications, allowing horizontal and vertical resolutions to be matched with horizontal and vertical measuring ranges, respectively. The CCD image contains information of a position and a height of a step defined by the object under measurement and the wafer stage. A pre-alignment measurement device includes, disposed in a direction of propagation of light, a laser, a first cylindrical lens, a first imaging lens, an illumination diaphragm, a second imaging lens, a second cylindrical lens and a CCD detector. The laser, an object under ...more ...less
4
US10247940B2
Publication/Patent Number: US10247940B2
Publication date: 2019-04-02
Application number: 15/777,908
Filing date: 2016-11-21
Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error. An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low ...more ...less
5
US10247549B2
Publication/Patent Number: US10247549B2
Publication date: 2019-04-02
Application number: 15/081,192
Filing date: 2016-03-25
Abstract: A shaft accuracy measuring device includes: a measurement unit including a light projecting unit that projects a measuring light and a light receiving unit that receives the measurement light projected by the light projecting unit; a motor installation unit that installs the motor such that the output shaft of the motor is disposed between the light projecting unit and the light receiving unit; and a calculation unit that calculates at least one of axial run-out, center run-out, and face run-out of the motor based on a measurement result of the measurement unit. A shaft accuracy measuring device includes: a measurement unit including a light projecting unit that projects a measuring light and a light receiving unit that receives the measurement light projected by the light projecting unit; a motor installation unit that installs the ...more ...less
6
US10261427B2
Publication/Patent Number: US10261427B2
Publication date: 2019-04-16
Application number: 15/869,661
Filing date: 2018-01-12
Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure. Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures ...more ...less
7
US10365093B2
Publication/Patent Number: US10365093B2
Publication date: 2019-07-30
Application number: 15/561,773
Filing date: 2016-03-10
Inventor: Lysen, Heinrich  
Abstract: The invention relates to a system and to a method for determining the displacement of two bodies relative to each other, wherein the system comprises a first camera, a second camera, a first lamp, and a second lamp, wherein both the first camera and the second camera comprise an objective and an image sensor having a sensor surface. The invention relates to a system and to a method for determining the displacement of two bodies relative to each other, wherein the system comprises a first camera, a second camera, a first lamp, and a second lamp, wherein both the first camera and the second camera comprise an ...more ...less
8
US10384607B2
Publication/Patent Number: US10384607B2
Publication date: 2019-08-20
Application number: 15/296,638
Filing date: 2016-10-18
Abstract: A system for estimating hitch angle offset is provided herein. A sensor system is configured to measure hitch angles between a vehicle and a trailer attached thereto. A controller is configured to calculate hitch angle offsets for a plurality of measured hitch angles, and extrapolate additional hitch angle offsets based on the calculated hitch angle offsets. A system for estimating hitch angle offset is provided herein. A sensor system is configured to measure hitch angles between a vehicle and a trailer attached thereto. A controller is configured to calculate hitch angle offsets for a plurality of measured hitch angles, and ...more ...less
9
US10337857B2
Publication/Patent Number: US10337857B2
Publication date: 2019-07-02
Application number: 15/786,273
Filing date: 2017-10-17
Abstract: Aspects are generally directed to multi-sensor boresight alignment methods and systems for a multi-spectral reimaging optical system. In one example, a multi-sensor boresight alignment system includes a system interface to receive a first image frame from a first sensor and a second image frame from a second sensor, the first image frame having a contrast within a first spectral band and including a first image of a plate having a pattern of apertures, and the second image frame having a contrast within a second spectral band and including a second image of the plate. The system includes a field programmable gate array (FPGA) coupled to the system interface, the FPGA configured to spot track each image frame to identify a corresponding centroid of the pattern of apertures and correct an optical alignment between the first and second sensors based on a position of the corresponding centroids. Aspects are generally directed to multi-sensor boresight alignment methods and systems for a multi-spectral reimaging optical system. In one example, a multi-sensor boresight alignment system includes a system interface to receive a first image frame from a first sensor and a ...more ...less
10
US10323542B2
Publication/Patent Number: US10323542B2
Publication date: 2019-06-18
Application number: 15/069,444
Filing date: 2016-03-14
Abstract: An alignment system includes a first visual indicia and a second visual indicia disposed on a first mobile unit, and a third visual indicia and a fourth visual indicia disposed on a second mobile unit. The alignment system also includes a visual inspection area configured to enable collective viewing of the first visual indicia, the second visual indicia, the third visual indicia, and the fourth visual indicia along a single direction. The alignment system is configured to align the first mobile unit with the second mobile unit along a vertical axis, a horizontal axis, and a rotational axis to help align a rotational coupling between the first mobile unit and the second mobile unit. An alignment system includes a first visual indicia and a second visual indicia disposed on a first mobile unit, and a third visual indicia and a fourth visual indicia disposed on a second mobile unit. The alignment system also includes a visual inspection area configured to ...more ...less
11
US10331045B2
Publication/Patent Number: US10331045B2
Publication date: 2019-06-25
Application number: 15/739,824
Filing date: 2016-05-26
Abstract: A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other. A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine ...more ...less
12
US2019101835A1
Publication/Patent Number: US2019101835A1
Publication date: 2019-04-04
Application number: 15/721,064
Filing date: 2017-09-29
Inventor: Chen, Yen-liang  
Abstract: An overlay error measurement structure includes a lower-layer pattern disposed over a substrate, and an upper-layer pattern disposed over the lower-layer pattern and at least partially overlapping with the lower-layer pattern. The lower-layer pattern includes a plurality of first sub-patterns extending in a first direction and being arranged in a second direction crossing the first direction. The upper-layer pattern includes a plurality of second sub-patterns extending in the first direction and being arranged in the second direction. At least one of a pattern pitch and a pattern width of at least one of at least a part of the first sub-patterns and at least a part of the second sub-patterns varies along the second direction. An overlay error measurement structure includes a lower-layer pattern disposed over a substrate, and an upper-layer pattern disposed over the lower-layer pattern and at least partially overlapping with the lower-layer pattern. The lower-layer pattern includes a plurality of ...more ...less
13
US2019101838A1
Publication/Patent Number: US2019101838A1
Publication date: 2019-04-04
Application number: 15/898,813
Filing date: 2018-02-19
Abstract: Embodiments described herein provide a method for cleaning contamination from sensors in a lithography tool without requiring recalibrating the lithography tool. More particularly, embodiments described herein teach cleaning the sensors using hydrogen radicals for a short period while the performance drifting is still above the drift tolerance. After a cleaning process described herein, the lithography tool can resume production without recalibration. Embodiments described herein provide a method for cleaning contamination from sensors in a lithography tool without requiring recalibrating the lithography tool. More particularly, embodiments described herein teach cleaning the sensors using hydrogen radicals for a short period ...more ...less
14
US2019086200A1
Publication/Patent Number: US2019086200A1
Publication date: 2019-03-21
Application number: 15/750,972
Filing date: 2017-12-06
Inventor: Amit, Eran  
Abstract: Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Machine learning algorithm application to measurements and/or simulations of metrology measurements of metrology targets are disclosed for deriving metrology data such as overlays from multi-layered target and corresponding configurations of targets are provided to enable such measurements. Quasi-periodic targets which are based on device patterns are shown to improve the similarity between target and device designs. Offsets are introduced only in non-critical direction and/or sensitivity is calibrated to enable, together with the solutions for multi-layer measurements and quasi-periodic target measurements, direct device optical metrology measurements. Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Machine ...more ...less
15
US2019242701A1
Publication/Patent Number: US2019242701A1
Publication date: 2019-08-08
Application number: 16/100,458
Filing date: 2018-08-10
Abstract: A sensing device for measuring an offset along a longitudinal axis comprises a housing including a plurality of slots, two or more arrays of optical sensors aligned along the longitudinal axis, at least one of the arrays being offset along the longitudinal axis with respect to the other arrays and a microcontroller coupled to the two or more arrays of optical sensors and configured to determine a positional offset along the longitudinal axis at which light is detected by at least one of arrays of optical sensors. In some embodiments, each of the optical sensors of the arrays are positioned within the housing underneath one of the plurality of slots to reduce an angle of incidence of radiation received. A sensing device for measuring an offset along a longitudinal axis comprises a housing including a plurality of slots, two or more arrays of optical sensors aligned along the longitudinal axis, at least one of the arrays being offset along the longitudinal axis with respect to ...more ...less