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1
US20190083181A1
Publication/Patent Number: US20190083181A1
Publication date: 2019-03-21
Application number: 16/180,171
Filing date: 2018-11-05
Abstract: A robot system includes a robot linkage (202) having one or more arms connected by two joints (220, 222). The joints each including a joint axis of rotation (206 or 208) and a light source (128) aligned with the respective joint axis. The light sources are configured to direct light along the respective joint axis such that light from the light sources intersects at a position along an instrument (204) being held in an operational position by the robot linkage to define a remote center of motion (RCM) for the robot linkage. A robot system includes a robot linkage (202) having one or more arms connected by two joints (220, 222). The joints each including a joint axis of rotation (206 or 208) and a light source (128) aligned with the respective joint axis. The light sources are configured to direct ...more ...less
2
US20190086200A1
Publication/Patent Number: US20190086200A1
Publication date: 2019-03-21
Application number: 15/750,972
Filing date: 2017-12-06
Inventor: Amit, Eran  
Abstract: Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Machine learning algorithm application to measurements and/or simulations of metrology measurements of metrology targets are disclosed for deriving metrology data such as overlays from multi-layered target and corresponding configurations of targets are provided to enable such measurements. Quasi-periodic targets which are based on device patterns are shown to improve the similarity between target and device designs. Offsets are introduced only in non-critical direction and/or sensitivity is calibrated to enable, together with the solutions for multi-layer measurements and quasi-periodic target measurements, direct device optical metrology measurements. Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Machine ...more ...less
3
US20190086201A1
Publication/Patent Number: US20190086201A1
Publication date: 2019-03-21
Application number: 16/121,780
Filing date: 2018-09-05
Abstract: A method of determining a parameter of a patterning process applied to an object comprising two features (for example an overlay of the two features) comprises: irradiating the two features of the object with a radiation beam and receiving at least a portion of the radiation beam scattered from the two features of the object. The at least a portion of the radiation beam comprises: a first portion comprising at least one diffraction order and a second portion comprising at least one diffraction order that is different to a diffraction order of the first portion. The method further comprises moderating a phase difference between the first and second portions and combining the first and second portions such that they interfere to produce a time dependent intensity signal. The method further comprises determining the parameter of the patterning process from a contrast of the time dependent intensity signal. A method of determining a parameter of a patterning process applied to an object comprising two features (for example an overlay of the two features) comprises: irradiating the two features of the object with a radiation beam and receiving at least a portion of the radiation ...more ...less
4
US20190072381A1
Publication/Patent Number: US20190072381A1
Publication date: 2019-03-07
Application number: 15/697,442
Filing date: 2017-09-06
Abstract: An automated rivet measurement system comprises a number of end effectors, a number of cameras, a processor, and a comparator. The number of end effectors is configured to perform drilling and riveting on a structure. The number of cameras is connected to the number of end effectors. The number of cameras is configured to take a first image of a hole in the structure and a second image of a rivet in the hole. The processor is configured to process the first image and the second image to identify a number of reference points in the first image and the second image. The comparator is configured to determine a rivet concentricity using the hole in the first image and the rivet in the second image, in which the first image and the second image are aligned using the number of reference points. An automated rivet measurement system comprises a number of end effectors, a number of cameras, a processor, and a comparator. The number of end effectors is configured to perform drilling and riveting on a structure. The number of cameras is connected to the number of end ...more ...less
5
EP3278059B1
Publication/Patent Number: EP3278059B1
Publication date: 2019-02-13
Application number: 16716155.3
Filing date: 2016-03-10
Inventor: Lysen, Heinrich  
6
US10247549B2
Publication/Patent Number: US10247549B2
Publication date: 2019-04-02
Application number: 15/081,192
Filing date: 2016-03-25
Abstract: A shaft accuracy measuring device includes: a measurement unit including a light projecting unit that projects a measuring light and a light receiving unit that receives the measurement light projected by the light projecting unit; a motor installation unit that installs the motor such that the output shaft of the motor is disposed between the light projecting unit and the light receiving unit; and a calculation unit that calculates at least one of axial run-out, center run-out, and face run-out of the motor based on a measurement result of the measurement unit. A shaft accuracy measuring device includes: a measurement unit including a light projecting unit that projects a measuring light and a light receiving unit that receives the measurement light projected by the light projecting unit; a motor installation unit that installs the ...more ...less
7
US20190101835A1
Publication/Patent Number: US20190101835A1
Publication date: 2019-04-04
Application number: 15/721,064
Filing date: 2017-09-29
Inventor: Chen, Yen-liang  
Abstract: An overlay error measurement structure includes a lower-layer pattern disposed over a substrate, and an upper-layer pattern disposed over the lower-layer pattern and at least partially overlapping with the lower-layer pattern. The lower-layer pattern includes a plurality of first sub-patterns extending in a first direction and being arranged in a second direction crossing the first direction. The upper-layer pattern includes a plurality of second sub-patterns extending in the first direction and being arranged in the second direction. At least one of a pattern pitch and a pattern width of at least one of at least a part of the first sub-patterns and at least a part of the second sub-patterns varies along the second direction. An overlay error measurement structure includes a lower-layer pattern disposed over a substrate, and an upper-layer pattern disposed over the lower-layer pattern and at least partially overlapping with the lower-layer pattern. The lower-layer pattern includes a plurality of ...more ...less
8
US10197389B2
Publication/Patent Number: US10197389B2
Publication date: 2019-02-05
Application number: 15/305,166
Filing date: 2016-08-18
Abstract: Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions. Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a ...more ...less
9
US10197390B2
Publication/Patent Number: US10197390B2
Publication date: 2019-02-05
Application number: 15/540,909
Filing date: 2015-12-30
Abstract: A pre-alignment measurement device includes, disposed in a direction of propagation of light, a laser, a first cylindrical lens, a first imaging lens, an illumination diaphragm, a second imaging lens, a second cylindrical lens and a CCD detector. The laser, an object under measurement and the CCD detector are arranged at respective apexes of a triangle formed by the measurement device for pre-alignment. A light beam is emanated by the laser and is transformed into a line beam. The line beam is reflected by the object under measurement and then passes through the second cylindrical lens to form a CCD image which has different horizontal and vertical magnifications, allowing horizontal and vertical resolutions to be matched with horizontal and vertical measuring ranges, respectively. The CCD image contains information of a position and a height of a step defined by the object under measurement and the wafer stage. A pre-alignment measurement device includes, disposed in a direction of propagation of light, a laser, a first cylindrical lens, a first imaging lens, an illumination diaphragm, a second imaging lens, a second cylindrical lens and a CCD detector. The laser, an object under ...more ...less
10
US10199251B2
Publication/Patent Number: US10199251B2
Publication date: 2019-02-05
Application number: 15/949,205
Filing date: 2018-04-10
Abstract: A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The optical element projects the measurement light, as projection light, generated by the light source and receives reflected light. The reflective member is disposed on the transport device. The reflective member reflects the projection light toward the placement table, and reflects the reflected light of the projection light, which is projected toward the placement table, toward the optical element. The drive unit operates the transport device so that the reflective member scans a plurality of linear scanning ranges. The controller calculates positional relationship between the focus ring and the object placed on the placement table based on the reflected light within the plurality of linear scanning ranges. A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The ...more ...less
11
US10215559B2
Publication/Patent Number: US10215559B2
Publication date: 2019-02-26
Application number: 14/879,534
Filing date: 2015-10-09
Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a primary, multiple patterned target is measured and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. In some other examples, a primary, multiple patterned target and an assist target are measured and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. In some other examples, a primary, multiple patterned target is measured at different process steps and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a ...more ...less
12
EP3106831B1
Publication/Patent Number: EP3106831B1
Publication date: 2019-01-16
Application number: 15748746.3
Filing date: 2015-02-05
Abstract: Parallel laser light beams (L11, L21) are irradiated from different positions into a telescope (200). Beams of laser light (L12, L22) are incident on a secondary mirror attitude detection mirror (127) from different locations. Laser light detectors (128, 129) detect each beam of laser light reflected by the secondary mirror attitude detection mirror (127). A first attitude calculator (130) determines an amount of attitude variation of a secondary mirror (230) based on a result detected by the laser light detectors (128, 129). The laser light detectors (134, 135) detect each beam of the laser light reflected by the primary mirror (220) and the secondary mirror (230) after entering the telescope (200). A second attitude calculator (136) determines an amount of attitude variation of the primary mirror (220) based on a result detected by the laser light detectors (134, 135) and the result detected by the laser light detectors (128, 129). Parallel laser light beams (L11, L21) are irradiated from different positions into a telescope (200). Beams of laser light (L12, L22) are incident on a secondary mirror attitude detection mirror (127) from different locations. Laser light detectors (128, 129) detect each beam of ...more ...less
13
US20190120617A1
Publication/Patent Number: US20190120617A1
Publication date: 2019-04-25
Application number: 16/170,085
Filing date: 2018-10-25
Abstract: A workpiece alignment system is provided has a light emission apparatus that directs a light beam at a plurality of wavelengths along a path at a shallow angle toward a first side of a workpiece plane at a peripheral region. A light receiver apparatus, receives the light beam on a second side opposite the first side. A rotation device selectively rotates a workpiece support. According controller determines a position of the workpiece based on an amount of the light beam received through the workpiece when the workpiece intersects the path. A sensitivity of the light receiver apparatus is controlled based on a transmissivity of the workpiece. A position of the workpiece is determined when the workpiece is rotated based on the rotational position, an amount of the light beam received, the transmissivity of the workpiece, detection of a workpiece edge, and the controlled sensitivity of the light receiver apparatus. A workpiece alignment system is provided has a light emission apparatus that directs a light beam at a plurality of wavelengths along a path at a shallow angle toward a first side of a workpiece plane at a peripheral region. A light receiver apparatus, receives the light beam on ...more ...less
14
US20190121243A1
Publication/Patent Number: US20190121243A1
Publication date: 2019-04-25
Application number: 16/227,351
Filing date: 2018-12-20
Inventor: Shibazaki, Yuichi  
Abstract: In an exposure apparatus that has an illumination optical system to illuminate a mask with an illumination light and a projection optical system to project a pattern image of the illuminated mask onto a substrate, first and second movable bodies, respectively holding the mask and the substrate, are moved based on measurement information of first and the second encoder systems so that, in an exposure operation of the substrate, scanning exposure in which the mask and the substrate are each moved relative to the illumination light is performed with a first direction within the predetermined plane serving as a scanning direction while compensating for a measurement error of the second encoder system that occurs due to at least one of tilt of the second head of the second encoder system and tilt in telecentricity of the second head. In an exposure apparatus that has an illumination optical system to illuminate a mask with an illumination light and a projection optical system to project a pattern image of the illuminated mask onto a substrate, first and second movable bodies, respectively holding the mask ...more ...less