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1
US20050037287A1
Publication/Patent Number: US20050037287A1
Publication date: 2005-02-17
Application number: 10/914,336
Filing date: 2004-08-09
Assignee: AGFA-GEVAERT
Abstract: A method for making a lithographic printing plate is disclosed wherein the method comprises the steps of: (i) providing a lithographic printing plate precursor comprising a photosensitive coating on a substrate having a hydrophilic surface, (ii) image-wise exposing said photosensitive coating, (iii) developing said exposed coating to form an image on said substrate and optionally gumming the plate and (iv) baking the image on the plate, wherein said baking step is carried out within a dwell-time of less than 1 minute and wherein the chemical resistance of the coating against printing liquids and press chemicals is improved. This baking step is preferably carried out by exposing the printing plate to an infrared radiation source, preferably in a dynamic configuration. A method for making a lithographic printing plate is disclosed wherein the method comprises the steps of: (i) providing a lithographic printing plate precursor comprising a photosensitive coating on a substrate having a hydrophilic surface, (ii) image-wise exposing said ...more ...less
2
US20050084802A1
Publication/Patent Number: US20050084802A1
Publication date: 2005-04-21
Application number: 10/960,320
Filing date: 2004-10-07
Inventor: Mori, Takahiro  
Abstract: Disclosed is a printing plate material comprising a support and provided thereon, a light sensitive layer containing a sensitizing dye, which is insoluble in water and soluble in an organic solvent, and particles to which the sensitizing dye is adhered.
3
US20050211119A1
Publication/Patent Number: US20050211119A1
Publication date: 2005-09-29
Application number: 10/811,763
Filing date: 2004-03-29
Inventor: Markhart, Gary  
Abstract: An improved thermal development apparatus is used to remove uncured photopolymer from the imaged surface of a flexographic printing element. The apparatus typically comprises one or more heatable rolls that are contactable with an imaged surface of a flexographic printing element; and means for maintaining contact between the one or more heatable rolls and the imaged surface of the flexographic printing element. The one or more heatable rolls are heated and is moved over at least a portion of the imaged surface of the flexographic printing element, and non-crosslinked polymer on the imaged surface of the flexographic printing element is melted and removed by the one or more heatable rolls. An improved thermal development apparatus is used to remove uncured photopolymer from the imaged surface of a flexographic printing element. The apparatus typically comprises one or more heatable rolls that are contactable with an imaged surface of a flexographic printing ...more ...less
4
US20050175301A1
Publication/Patent Number: US20050175301A1
Publication date: 2005-08-11
Application number: 11/104,814
Filing date: 2005-04-13
Abstract: A planar optical waveguide assembly prepared by a method comprising the steps of (i) applying a curable polymer composition to a surface of a substrate to form a polymer film; (ii) curing the polymer film to form a lower clad layer; (iii) applying a silicone composition to the lower clad layer to form a silicone film; (iv) exposing at least one selected region of the silicone film to radiation having a wavelength of from 150 to 800 nm to produce a partially exposed film having at least one exposed region and at least one non-exposed region; (v) removing the non-exposed region of the partially exposed film with a developing solvent to form a patterned film; and (vi) heating the patterned film for an amount of time sufficient to form at least one silicone core having a refractive index of from 1.3 to 1.7 at 23° C. for light having a wavelength of 589 nm; wherein the lower clad layer has a refractive index less than the refractive index of the silicone core. A planar optical waveguide assembly prepared by a method comprising the steps of (i) applying a curable polymer composition to a surface of a substrate to form a polymer film; (ii) curing the polymer film to form a lower clad layer; (iii) applying a silicone composition to the ...more ...less
5
US20050227180A1
Publication/Patent Number: US20050227180A1
Publication date: 2005-10-13
Application number: 11/091,710
Filing date: 2005-03-29
Abstract: The method and apparatus make a printing plate such as a lithographic printing plate by exposing an original plate of the printing plate such as a presensitized plate in a substantially oxygen-free state. The method and apparatus deprive substantially of oxygen at least an exposed area of the original plate being exposed to light at least during exposure and expose the original plate to the light at a wavelength of between 250 nm and 420 nm. The original plate has on a support an image recording layer containing a polymerization initiator, a polymerizable compound and a binder polymer, being sensitive to the light at the wavelengths of between 250 nm and 420 nm, having no oxygen barrier layer, and being removable with a printing ink and/or a fountain solution. That is, a latent image is formed by photo-polymerization on the original plate and the original plate is subjected to development on a printing press. The method and apparatus make a printing plate such as a lithographic printing plate by exposing an original plate of the printing plate such as a presensitized plate in a substantially oxygen-free state. The method and apparatus deprive substantially of oxygen at least an ...more ...less
6
US20050026083A1
Publication/Patent Number: US20050026083A1
Publication date: 2005-02-03
Application number: 10/898,619
Filing date: 2004-07-26
Inventor: Ron, Hannoch  
Assignee: Ron, Hannoch
Abstract: The present invention provides for a method of enhancing visible contrast in an imaged lithographic printing plate, which comprises the use of a translucent or opaque polymer as a substrate for said plate. Such polymer may be high molecular weight polyester. The invention further provides a lithographic printing plate which comprises a substrate and at least one imaging layer, the substrate comprising translucent or opaque polymer. The present invention provides for a method of enhancing visible contrast in an imaged lithographic printing plate, which comprises the use of a translucent or opaque polymer as a substrate for said plate. Such polymer may be high molecular weight polyester. The invention ...more ...less
7
US20050211121A1
Publication/Patent Number: US20050211121A1
Publication date: 2005-09-29
Application number: 11/055,196
Filing date: 2005-02-10
Abstract: An improved flexo processor and a method of using the improved flexo processor to increase the flexibility of both the type and the size of the flexographic printing element that may be processed. The novel thermal plate processor system is capable of processing both flat and round photosensitive printing elements with only minimal changes to the system. The thermal plate processor system may also include means for exposure and post-exposure/detack in the same system. An improved flexo processor and a method of using the improved flexo processor to increase the flexibility of both the type and the size of the flexographic printing element that may be processed. The novel thermal plate processor system is capable of processing both flat and ...more ...less
8
US20040191639A1
Publication/Patent Number: US20040191639A1
Publication date: 2004-09-30
Application number: 10/397,459
Filing date: 2003-03-26
Abstract: A micro-imprinting method, and template for use in such a method, in which at least one surface of the template includes an alkyl silane release coating, where the alkyl silane is free of fluorine atoms.
9
US20040191640A1
Publication/Patent Number: US20040191640A1
Publication date: 2004-09-30
Application number: 10/400,715
Filing date: 2003-03-27
Abstract: The present invention provides a patterned substrate and methods of forming patterns on a substrate, in which a thermally sensitive composition composed of an inorganic nanopaste is applied onto a surface of a substrate to form a layer. The layer may be imaged and developed to form a pattern area that adheres to the surface of the substrate. The patterned substrate may be used in the production of printing plates and masks. The present invention provides a patterned substrate and methods of forming patterns on a substrate, in which a thermally sensitive composition composed of an inorganic nanopaste is applied onto a surface of a substrate to form a layer. The layer may be imaged and developed to ...more ...less
10
US20040180297A1
Publication/Patent Number: US20040180297A1
Publication date: 2004-09-16
Application number: 10/798,998
Filing date: 2004-03-12
Abstract: Disclosed is a method for forming a fine pattern of a semiconductor device in which the spacing between neighboring lines is reduced to be less than the resolution limit of a lithographic process. The method includes the steps of: (a) sequentially forming a base layer to be patterned, a lower photoresist layer, a blocking layer and an upper photoresist layer on a substrate; (b) forming the first photoresist pattern on the upper photoresist layer, and etching the blocking layer according to the first photoresist pattern; (c) forming the second photoresist pattern on the lower photoresist layer, which is opened by the spacing of the first photoresist pattern, wherein the spacing of the first photoresist pattern is greater than a line width of the second photoresist pattern; (d) etching the base layer using the second photoresist pattern as a mask; and (e) stripping the remaining photoresist layer. Disclosed is a method for forming a fine pattern of a semiconductor device in which the spacing between neighboring lines is reduced to be less than the resolution limit of a lithographic process. The method includes the steps of: (a) sequentially forming a base layer to be ...more ...less
11
US20040157150A1
Publication/Patent Number: US20040157150A1
Publication date: 2004-08-12
Application number: 10/669,076
Filing date: 2003-09-22
Inventor: Mori, Takahiro  
Abstract: Disclosed are a printing plate material comprising a substrate and provided thereon, a component layer comprising a hydrophilic layer and an image formation layer, the hydrophilic layer being provided closer to the substrate than the image formation layer, wherein the hydrophilic layer contains an electron providing dye precursor, the image formation layer contains an organic electron accepting developing agent, and the component layer contains a light heat conversion material. Disclosed are a printing plate material comprising a substrate and provided thereon, a component layer comprising a hydrophilic layer and an image formation layer, the hydrophilic layer being provided closer to the substrate than the image formation layer, wherein the ...more ...less
12
US20040161706A1
Publication/Patent Number: US20040161706A1
Publication date: 2004-08-19
Application number: 10/749,648
Filing date: 2003-12-30
Abstract: A flash memory device having a reduced source resistance and a fabrication method thereof are disclosed. An example flash memory includes a cell region including a gate, a source line, a drain contact, and a cell trench area for device isolation on a silicon substrate. The example flash memory also includes a peripheral region positioned around the cell region and including a subsidiary circuit and a peripheral trench area for device isolation on the silicon substrate, wherein the cell trench area of the cell region is shallower than the peripheral trench area of the peripheral region. A flash memory device having a reduced source resistance and a fabrication method thereof are disclosed. An example flash memory includes a cell region including a gate, a source line, a drain contact, and a cell trench area for device isolation on a silicon substrate. The ...more ...less
13
US20040161710A1
Publication/Patent Number: US20040161710A1
Publication date: 2004-08-19
Application number: 10/735,688
Filing date: 2003-12-16
Abstract: A pattern formation method of this invention includes the steps of forming a resist film of a chemically amplified resist material and forming a resist pattern by developing the resist film with an alkaline developer after irradiating, through a mask having a desired pattern, the resist film with exposing light having a light component entering the resist film at the Brewster's angle. A thickness reduction ratio of the resist pattern to the resist film is 5% or less. A pattern formation method of this invention includes the steps of forming a resist film of a chemically amplified resist material and forming a resist pattern by developing the resist film with an alkaline developer after irradiating, through a mask having a desired pattern ...more ...less
14
US20040091818A1
Publication/Patent Number: US20040091818A1
Publication date: 2004-05-13
Application number: 10/292,562
Filing date: 2002-11-12
Abstract: A method of forming an electrical feature such as a 3-D circuit on a substrate is described. The method includes the following steps. A catalytic paint is first selectively deposited on the surface of a molded polymer substrate to form a paint coating of the substrate. A conductive metal such as copper or nickel is then deposited onto the coating to form a plating of the substrate. An electrical feature is then obtained by forming a precision conductive pattern in the conductive metal. A method of forming an electrical feature such as a 3-D circuit on a substrate is described. The method includes the following steps. A catalytic paint is first selectively deposited on the surface of a molded polymer substrate to form a paint coating of the substrate. A ...more ...less
15
US20040096777A1
Publication/Patent Number: US20040096777A1
Publication date: 2004-05-20
Application number: 10/706,112
Filing date: 2003-11-13
Abstract: A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photosensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a developing solution having a pH value of 13.0 or less at a developing speed in an unexposed domain of 0.05 &mgr;m/s or more and at an osmotic speed of a developing solution in an exposed domain of 0.1 &mgr;m/s or less. A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photosensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a ...more ...less
16
US20040048194A1
Publication/Patent Number: US20040048194A1
Publication date: 2004-03-11
Application number: 10/241,137
Filing date: 2002-09-11
Abstract: A tunable dielectric antireflective layer for use in photolithographic applications, and specifically, for use in an image transfer processing. The tunable dielectric antireflective layer provides a spin-on-glass (SOG) material that can act as both a hardmask and a deep UV antireflective layer (BARC). One such material is titanium oxide generated by spin-coating a titanium alkanate and curing the film by heat or electron beam. The material can be “tuned” to match index of refraction (n) with the index of refraction for the photoresist and also maintain a high absorbency value, k, at a specified wavelength. A unique character of the tunable dielectric antireflective layer is that the BARC/hardmask layer allows image transfer with deep ultraviolet photoresist. A tunable dielectric antireflective layer for use in photolithographic applications, and specifically, for use in an image transfer processing. The tunable dielectric antireflective layer provides a spin-on-glass (SOG) material that can act as both a hardmask and a deep UV ...more ...less
17
US20040041990A1
Publication/Patent Number: US20040041990A1
Publication date: 2004-03-04
Application number: 10/230,585
Filing date: 2002-08-29
Inventor: Wolber, John W.  
Abstract: An imaging system is disclosed for imaging and photo-processing flexographic media. The imaging system includes an input opening through which flexographic media may be input to the imaging system, an imaging unit, a photo-processing unit, and an output opening. The imaging unit is for imaging the flexographic media that is received through the input opening, and provides imaged flexographic media. The photo-processing unit receives the imaged flexographic media, and photo-processes the imaged flexographic media by illuminating the flexographic media. The photo-processing unit provides photo-processed imaged flexographic media. The photo-processed imaged flexographic media may exit the imaging system through the output opening. An imaging system is disclosed for imaging and photo-processing flexographic media. The imaging system includes an input opening through which flexographic media may be input to the imaging system, an imaging unit, a photo-processing unit, and an output opening. The imaging unit ...more ...less
18
US20040009417A1
Publication/Patent Number: US20040009417A1
Publication date: 2004-01-15
Application number: 10/418,680
Filing date: 2003-04-21
Abstract: This method of Fresnel oscillations takes advantage of oscillation effects within Fresnel patterns to produce finer resolution than can be printed in the prior art. Selected patterns are printed by selecting the mask-wafer gap for a given wavelength, or range of wavelengths, and given mask feature size. Following the principles of the coherence and with an optimization of bandwidth, the method of Fresnel oscillations employs paradigms or simulations in mask shapes to print specified patterns. By these methods, exposure times and throughput are optimized, consistent with required resolution in printing. Mask-wafer gaps and clear mask feature sizes are kept large. With multiple exposures, fine oscillation patterns in two dimensions can be printed with demagnification factors down to 20X the size of clear mask features. This method of Fresnel oscillations takes advantage of oscillation effects within Fresnel patterns to produce finer resolution than can be printed in the prior art. Selected patterns are printed by selecting the mask-wafer gap for a given wavelength, or range of wavelengths, and ...more ...less
19
US20040058814A1
Publication/Patent Number: US20040058814A1
Publication date: 2004-03-25
Application number: 10/332,900
Filing date: 2003-01-15
Abstract: The invention provides a multi-color image-forming material for recording an image by using an image-receiving sheet having an image-receiving layer and at least 4 kinds of heat transfer sheets different from each other in color and comprising a support having provided thereon at least a light-to-heat conversion layer and an image-forming layer, superposing the image-forming layer of each of the thermal transfer sheet on the image-receiving layer of the image-receiving sheet, in which the image-forming layer is opposed to the image-receiving layer, and irradiating a laser light thereto to transfer the laser-irradiated area of the image-forming layer to the image-receiving layer of the image-receiving sheet, wherein the material contains a heat transfer sheet (X) having an image-forming layer containing one selected from among Pigment Red 48:1, Pigment Red 48:3, Pigment Green 7, Pigment Blue 15:6, Pigment Blue 60, Pigment Violet 23 and Pigment Orange 43, and a method for forming a multi-color image comprises using an image-receiving sheet having an image-receiving layer and at least 5 kinds of heat transfer sheets including thermal transfer sheets for a color of yellow, magenta, cyan or black and each comprising a support having provided thereon at least a light-to-heat conversion layer and an image-forming layer, superposing the image-forming layer of each of the thermal transfer sheet on the image-receiving layer of the image-receiving sheet, and irradiating a laser light thereto to transfer the laser-irradiated area of the image-forming layer to the image-receiving layer of the image-receiving sheet and effect image recording, thus providing a multi-color image having an enlarged scope of reproducible hues. The invention provides a multi-color image-forming material for recording an image by using an image-receiving sheet having an image-receiving layer and at least 4 kinds of heat transfer sheets different from each other in color and comprising a support having provided thereon ...more ...less
20
US20040067432A1
Publication/Patent Number: US20040067432A1
Publication date: 2004-04-08
Application number: 10/264,814
Filing date: 2002-10-04
Abstract: Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling. Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric ...more ...less